Specific Process Knowledge/Lithography/Development: Difference between revisions
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===Process information=== | ===Process information=== | ||
'''Standard recipes''' | '''Standard process recipes''' | ||
*nLoF_40x2: double puddle, 40s. For development of AZ nLOF 2020 resist. | *nLoF_40x2: double puddle, 40s. For development of AZ nLOF 2020 resist. | ||
*MiR701 60s: single puddle, 60s. For development of AZ MiR 701 resist. | *MiR701 60s: single puddle, 60s. For development of AZ MiR 701 resist. | ||
*DUV 60s: single puddle, 60s. For development of DUV resists. | *DUV 60s: single puddle, 60s. For development of DUV resists. | ||
'''Utility recipes''' | |||
*UTIL-DR: Dome rinse. | *UTIL-DR: Dome rinse. | ||
*UTIL-BE: Bottle change. Danchip use only. | |||
=== Equipment performance and process related parameters === | === Equipment performance and process related parameters === | ||