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Specific Process Knowledge/Lithography/Development: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
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===Process information===
===Process information===


*Before using a one of developer batch's please check the "Litho4_Dev-7up-KOH" logbook to find out when they were used last time. A fresh bath can be reused without problems.  
*Before using one of developer baths, please check the "Litho4_Dev-7up-KOH" logbook to find out when they were last used. A fresh bath can be reused without problems.  
*The main rule is a developer made yesterday must be changed.  
*The main rule is a developer made yesterday must be changed.  
*Substrates are rinsed with water for 4-5 min. after development.
*Substrates are rinsed with water for 4-5 min. after development.
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