Jump to content

Specific Process Knowledge/Lithography/Development: Difference between revisions

← Older editNewer edit →
VisualWikitext
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,526 edits
Line 153: Line 153:


2. Fill the bath with the developer mixture and heat it to 22 °C before use.
2. Fill the bath with the developer mixture and heat it to 22 °C before use.
<br clear="all" />


=== Equipment performance and process related parameters ===
=== Equipment performance and process related parameters ===
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/Development"