Specific Process Knowledge/Lithography/Development: Difference between revisions
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'''Feedback to this section''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Coaters#Developer-1_and_Developer-2 click here]''' | '''Feedback to this section''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Coaters#Developer-1_and_Developer-2 click here]''' | ||
Developer-1 and Developer-2 | Developer-1 and Developer-2 | ||
'''The user APV, and contact information can be found in LabManager: [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=62 Developer-1] [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=63 Developer-2]''' | |||
===Process information=== | ===Process information=== | ||
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2. Fill the bath with the developer mixture and heat it to 22 °C before use. | 2. Fill the bath with the developer mixture and heat it to 22 °C before use. | ||
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