Specific Process Knowledge/Lithography/Development: Difference between revisions
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*10µm resist is 5 min | *10µm resist is 5 min | ||
==== | ====Procedure for making a new developer==== | ||
1. 800ml "Developer AZ 351" is mixed with 4000ml water in a special container in the fume hood. | 1. 800ml "Developer AZ 351" is mixed with 4000ml water in a special container in the fume hood. | ||
2. Fill the bath with | 2. Fill the bath with the developer mixture and heat it to 22 °C before use. | ||
===Overview of develop process=== | ===Overview of develop process=== | ||