Specific Process Knowledge/Lithography/Development: Difference between revisions

Revision as of 15:55, 19 March 2014 view source Taran (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891 3,528 edits →SSE Spinner ← Older edit		Revision as of 15:56, 19 March 2014 view source Taran (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891 3,528 edits →Developer-1 and Developer-2 Newer edit →
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	*2 syringe lines, which can be used for spinning of e-beam resist.		*2 syringe lines, which can be used for spinning of e-beam resist.

	'''The user manual, user APV, and contact information can be found in LabManager [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=~~188 LabManager~~] [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=~~188 LabManager~~]'''		'''The user manual, user APV, and contact information can be found in LabManager: [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=62 Developer-1] [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=63 Developer-2]'''