Specific Process Knowledge/Lithography/LiftOff: Difference between revisions
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== Process information == | == Process information == | ||
Lift-off wet bench is used for lift-off using resists soluble in acetone. AZ 5214E is soluble in acetone, AZ nLOF is not. | Lift-off wet bench is used for lift-off using resists soluble in acetone. AZ 5214E is soluble in acetone, cross linked (i.e. exposed and baked) AZ nLOF is not. | ||
For information on image reversal of AZ 5214E, see here: [[media:Process_Flow_AZ5214E_rev_vers2.docx |Process_Flow_AZ5214_rev_vers2.docx]] | For information on image reversal of AZ 5214E, see here: [[media:Process_Flow_AZ5214E_rev_vers2.docx |Process_Flow_AZ5214_rev_vers2.docx]] | ||