Specific Process Knowledge/Lithography/LiftOff: Difference between revisions
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== Process information == | == Process information == | ||
Lift-off Wet Bench is used for lift-off using resists that are soluble in NMP (''N''-Methyl-Pyrrolidone), supplied in the cleanroom as "Remover 1165". | Lift-off Wet Bench is used for lift-off using resists that are soluble in NMP (''N''-Methyl-Pyrrolidone), supplied in the cleanroom as "Remover 1165". Both AZ 5214E and AZ nLOF are soluble in NMP. | ||
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