Specific Process Knowledge/Lithography/LiftOff: Difference between revisions
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== Process information == | == Process information == | ||
Lift-off Wet Bench is used for lift-off using resists soluble in acetone. | Lift-off Wet Bench is used for lift-off using resists soluble in acetone. AZ 5214E is soluble in acetone, AZ nLOF is not. | ||
'''Process recommandations for Lift-off wet bench:''' | '''Process recommandations for Lift-off wet bench:''' | ||