Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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'''The user manual(s), quality control procedure(s) and results and contact information can be found in LabManager:''' | '''The user manual(s), quality control procedure(s) and results and contact information can be found in LabManager:''' | ||
Equipment info in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=44 LabManager] | Equipment info in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=44 LabManager] | ||
===Process information=== | |||
'''Positive tone resists:''' | |||
'''AZ 5214E and AZ 4562''' | |||
*1.5µm: 35-49 mJ/cm_<sub>2<sub> corresponding to 5-7 seconds exposure at 7 mW/cm2. | |||
'''AZ MiR 701''' | |||
'''Negative tone resists:''' | |||
'''AZ 5214E image reversal''' | |||
'''AZ nLOF 20XX''' | |||
<br clear="all" /> | <br clear="all" /> | ||