Specific Process Knowledge/Thin film deposition/Sputter coater: Difference between revisions
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= The Balzer Sputter coater = | = The Balzer Sputter coater = | ||
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!style="background:silver; color:black" align="left" valign="top" rowspan="2"|Performance | !style="background:silver; color:black" align="left" valign="top" rowspan="2"|Performance | ||
|style="background:LightGrey; color:black"|Film thickness||style="background:WhiteSmoke; color:black"| | |style="background:LightGrey; color:black"|Film thickness||style="background:WhiteSmoke; color:black"| | ||
*10 Å - | *10 Å - > 25 nm | ||
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|style="background:LightGrey; color:black"|Deposition rate | |style="background:LightGrey; color:black"|Deposition rate | ||
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|style="background:LightGrey; color:black"|Process pressure | |style="background:LightGrey; color:black"|Process pressure | ||
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* | *2*10<sub> -2</sub> mbar | ||
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!style="background:silver; color:black" align="left" valign="top" rowspan="3"|Substrates | !style="background:silver; color:black" align="left" valign="top" rowspan="3"|Substrates | ||
|style="background:LightGrey; color:black"|Batch size | |style="background:LightGrey; color:black"|Batch size | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*One 100 mm wafer | *One sample smaller than a 100 mm wafer | ||
*Several smaller samples | *Several smaller samples | ||
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