Specific Process Knowledge/Etch/DRIE-Pegasus/processA: Difference between revisions

@@ Line 115: / Line 115: @@
 ! QC Recipe:
-! OH_POLYA
+|+ '''Process A '''
-|-
-| SF<sub>6</sub> flow
-|32 sccm
 |-
-|O<sub>2</sub> flow
+!
-|8 sccm
+! colspan="2" | Step 1
-|-
+! colspan="2" | Step 2
-|Pressure
-|80 mTorr
 |-
-|RF-power
+! width="120" | Parameter
-|30 W
+! width="120" | Etch
+! width="120" | Dep
+! width="120" | Etch
+! width="120" | Dep
 |-
-|Etch Load
+! Gas flow (sccm)
-|50%
+| SF<sub>6</sub> 350 (1.5 s) 550
+| C<sub>4</sub>F<sub>8</sub> 200
+| SF<sub>6</sub> 350 (1.5 s) 550
+| C<sub>4</sub>F<sub>8</sub> 200
 |-
-|}
+! Cycle time (secs)
+| 7.0
+| 4.0
+| 7.0
+| 4.0
+|-
+! Pressure (mtorr)
+| 25 (1.5 s) 90 >> 150
+| 25
+| 25 (1.5 s) 150
+| 25
+|-
+! Coil power (W)
+| 2800
+| 2000
+| 2800
+| 2000
+|-
+! Platen power (W)
+| 120 >> 140 (1.5) 45
+| 0
+| 140 (1.5) 45
+| 0
+|-
+! Cycles
+| colspan="2" | 11 (keep fixed)
+| colspan="2" | 44 (vary this)
+|-
+! Common
+| colspan="4" | Temperature 20 degs, HBC 10 torr, Short funnel, with baffle & 5mm spacers
+|-
 | align="center" valign="top"|
 {| border="2" cellspacing="1" cellpadding="2" align="center" style="width:500px"