Jump to content

Specific Process Knowledge/Thermal Process/Dope with Phosphorus: Difference between revisions

← Older editNewer edit →
VisualWikitext
Mdyma (talk | contribs)
danchip
584 edits
Mdyma (talk | contribs)
danchip
584 edits
No edit summary
Line 2: Line 2:




The furnace A4 phosphorus predep(N-predep) can be used to predeposit silicon wafers with phosphor. The silicon wafers are positioned in a quarts boat. Phosphor is predeposited in the silicon wafers.
The furnace A4 phosphorus Predep (A4) can be used to predeposition silicon wafers with phosphorus doping (N-type). The silicon wafers are positioned in a quarts boat.


'''
'''
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thermal_Process/Dope_with_Phosphorus"