Specific Process Knowledge/Thin film deposition/PECVD: Difference between revisions
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== Recipes on PECVD1(will be removed soon), PECVD2 and PECVD3 == | == Recipes on PECVD1(will be removed soon), PECVD2 and PECVD3 == | ||
*Recipes for PECVD2 are in the III-V entry in LAbAdviser, see here | *Recipes for PECVD2 are in the III-V entry in LAbAdviser, see [[Specific Process Knowledge/III-V Process/thin film dep/pecvd2| here]] | ||
*[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD#Recipes on PECVD1 for deposition of silicon oxides|Recipes on PECVD1 for deposition of silicon oxides]] | *[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD#Recipes on PECVD1 for deposition of silicon oxides|Recipes on PECVD1 for deposition of silicon oxides]] | ||
*[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using PECVD#Recipes on PECVD1 for deposition of silicon nitride and silicon oxynitride|Recipes on PECVD1 for deposition of silicon nitride and silicon oxynitride]] | *[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride/Deposition of Silicon Nitride using PECVD#Recipes on PECVD1 for deposition of silicon nitride and silicon oxynitride|Recipes on PECVD1 for deposition of silicon nitride and silicon oxynitride]] | ||