Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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*[[/Making Mask design#Tips_and_tricks_for_mask_designing|Tips and tricks for mask designing]] | *[[/Making Mask design#Tips_and_tricks_for_mask_designing|Tips and tricks for mask designing]] | ||
==Alignment marks== | ==Alignment marks== | ||
Following alignment marks are suggested to use on the EVG620 automatic aligner for good pattern recognition. Pleased be adviced that they can be removed in KOH etching. | Following alignment marks are suggested to use on the EVG620 automatic aligner for good pattern recognition. Pleased be adviced that they can be removed in KOH etching. | ||