Jump to content

Specific Process Knowledge/Lithography/UVExposure: Difference between revisions

← Older editNewer edit →
VisualWikitext
Elkh (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
343 edits
Elkh (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
343 edits
Line 391: Line 391:
| style="background:LightGrey; color:black"|Exposure light/filters
| style="background:LightGrey; color:black"|Exposure light/filters
|style="background:WhiteSmoke; color:black" align="center" colspan="2"|
|style="background:WhiteSmoke; color:black" align="center" colspan="2"|
* Near UV
* Near UV(350-450nm)
* Deep UV
* Mid UV (260-320nm)
* Deep UV(220-260nm)


|-
|-
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/UVExposure"