Specific Process Knowledge/Lithography/UVExposure: Difference between revisions
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|style="background:LightGrey; color:black"|Exposure light/filters/spectrum | |style="background:LightGrey; color:black"|Exposure light/filters/spectrum | ||
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* 350W Hg-lamp, 365nm filter, | * 350W Hg-lamp, 365nm filter, intensity in Constant Intensity(CI) mode 7mW/cm2 @ 365 nm | ||
*303nm filter optional | |||
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* 350W Hg-lamp, SU8 filter, 365nm filter optional | * 350W Hg-lamp, SU8 filter, 365nm filter optional | ||