Specific Process Knowledge/Lithography/UVLithography: Difference between revisions

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|'''Comments'''
|'''Comments'''
|'''Technical reports'''
|'''Technical reports'''
|'''Spinner'''
|'''[[Specific_Process_Knowledge/Lithography/Coaters|Spin Coating]]'''
|'''[[Specific_Process_Knowledge/Lithography/Development|Development]]'''
|'''[[Specific_Process_Knowledge/Lithography/Development|Development]]'''
|'''Rinse'''
|'''Rinse'''

Revision as of 11:49, 12 August 2013

Process Resist Type Comment 1 Comment 2 Comment 3
Lift off NLOF AA BB CC
Dry Etch DD
  • DD1
  • DD2
EE FF GG
Wet Etch HH
  • HH1
  • HH2
II JJ KK



Resist Comments Pre-treatment Resist Coating Exposure Baking Developing Stripping, Lift-off
AA AA AA AA AA AA AA AA
BB BB BB BB BB BB BB BB
CC CC CC CC CC CC CC CC


Resist Overview

Resist Polarity Manufacturer Comments Technical reports Spin Coating Development Rinse Remover Process flows (in docx-format)
AZ5214E Positive AZ5214E.pdf‎ SSE, KS Spinner, III-V Spinner


AZ4562 Positive AZ4500.pdf‎ SSE, KS Spinner
AZ MiR 701 Positive AZ_MiR_701.pdf‎ Spin Track 1 + 2
AZ nLOF 2020 Negative AZ_nLOF_2020.pdf‎ Spin Track 1 + 2


SU8 Positive KS Spinner