Specific Process Knowledge/Lithography/UVLithography: Difference between revisions
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|'''Technical reports''' | |'''Technical reports''' | ||
|'''Spinner''' | |'''Spinner''' | ||
|''' | |'''[[Specific_Process_Knowledge/Lithography/Development|Development]]''' | ||
|'''Rinse''' | |'''Rinse''' | ||
|'''Remover''' | |'''Remover''' |
Revision as of 11:48, 12 August 2013
Process | Resist Type | Comment 1 | Comment 2 | Comment 3 |
---|---|---|---|---|
Lift off | NLOF | AA | BB | CC |
Dry Etch | DD
|
EE | FF | GG |
Wet Etch | HH
|
II | JJ | KK |
Resist | Comments | Pre-treatment | Resist Coating | Exposure | Baking | Developing | Stripping, Lift-off |
---|---|---|---|---|---|---|---|
AA | AA | AA | AA | AA | AA | AA | AA |
BB | BB | BB | BB | BB | BB | BB | BB |
CC | CC | CC | CC | CC | CC | CC | CC |
Resist Overview
Resist | Polarity | Manufacturer | Comments | Technical reports | Spinner | Development | Rinse | Remover | Process flows (in docx-format) |
AZ5214E | Positive | AZ5214E.pdf | SSE, KS Spinner, III-V Spinner |
| |||||
AZ4562 | Positive | AZ4500.pdf | SSE, KS Spinner | ||||||
AZ MiR 701 | Positive | AZ_MiR_701.pdf | Spin Track 1 + 2 | ||||||
AZ nLOF 2020 | Negative | AZ_nLOF_2020.pdf | Spin Track 1 + 2 |
| |||||
SU8 | Positive | KS Spinner |
|