Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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= Process Flows = | = Process Flows = | ||
You can download a template for process-flows here (word format): | |||
[[media:Process_flow_template_v2.2b.docx|Process_flow_template_v2.2b.docx]]. | |||
You can use the SSE-spinner, the Manual Spinner 1 or the III-V spinner to coat wafer or chips with e-beam resist. Read more about these spinners | You can use the SSE-spinner, the Manual Spinner 1 or the III-V spinner to coat wafer or chips with e-beam resist. Read more about these spinners | ||
<span class="plainlinks">[http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Coaters here]</span> (opens in a new tab). | <span class="plainlinks">[http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Coaters here]</span> (opens in a new tab). | ||