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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD: Difference between revisions

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2,908 edits
Line 8: Line 8:
|Recipe name  
|Recipe name  
|SiH4 flow [sccm]
|SiH4 flow [sccm]
|N<math>_2</math>O flow [sccm]
|N<sub>2</sub>O flow [sccm]
|N2 flow [sccm]
|N2 flow [sccm]
|B2H6 flow [sccm]
|B2H6 flow [sccm]
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