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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of SiO2 in E-Beam Evaporator Temescal-2: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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=Optical functions=
=Optical functions=


Results have been obtained for <100> 150 mm Si wafers with native oxide, based on ellipsometry study. Sellmeier model has been implemented for refractive index fitting.
Results have been obtained for <100> 150 mm Si wafers with native oxide, based on [[Specific_Process_Knowledge/Characterization/Optical_characterization#Ellipsometer|ellipsometry study]]. Sellmeier model has been implemented for refractive index fitting.


<gallery caption="" widths="400px" heights="400px" perrow="1">
<gallery caption="" widths="400px" heights="400px" perrow="1">
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