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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD: Difference between revisions

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|Description
|Description
|-  
|-  
|1oxide/standard
|1oxide/1ox_std/standard
|17
|17
|1600
|1600
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|Uniformity [%]
|Uniformity [%]
|-  
|-  
|1oxide/standard
|1oxide/1ox_std/standard
|~0.193
|~0.193
|1.46
|1.46
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