Specific Process Knowledge/Thin film deposition/Deposition of Chromium/Thermal evaporation of Cr in Thermal evaporator: Difference between revisions

Revision as of 15:19, 29 May 2021 view source Eves (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 4,346 edits →X-ray reflectivity method ← Older edit		Revision as of 15:19, 29 May 2021 view source Eves (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 4,346 edits →X-ray reflectivity method Newer edit →
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	The following model is selected for XRR fitting: Native chromium oxide, bulk chromium layer, native silicon oxide, and the bulk silicon substrate. ~~fitting~~ result presented in the table.		The following model is selected for XRR fitting: Native chromium oxide, bulk chromium layer, native silicon oxide, and the bulk silicon substrate. Fitting result presented in the table.