Jump to content

Specific Process Knowledge/Thin film deposition/Deposition of Chromium/Thermal evaporation of Cr in Thermal evaporator: Difference between revisions

← Older editNewer edit →
VisualWikitext
Eves (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,346 edits
Eves (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
4,346 edits
Line 30: Line 30:
|-
|-
!style="background:WhiteSmoke; color:black;" align="center"|Maximum Thickness
!style="background:WhiteSmoke; color:black;" align="center"|Maximum Thickness
|style="background:WhiteSmoke; color:black" align="center"|<b>80-100 nm</b>
|style="background:WhiteSmoke; color:black" align="center"|<b>100 nm</b>


|-
|-
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Chromium/Thermal_evaporation_of_Cr_in_Thermal_evaporator"