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Line 14: Line 14:
Mask design used in the investigation: [[Media:LithoTestAlign 2025 v10.gds|LithoTestAlign_2025_v10.gds]]
Mask design used in the investigation: [[Media:LithoTestAlign 2025 v10.gds|LithoTestAlign_2025_v10.gds]]


=Additional data=
=Data from the investigation=
<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]
<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]


==AZ 5214E==
==AZ 5214E==
===Resolution===
===Resolution===
<br clear="all" />
'''Resolution at optimal processing conditions for 1.5µm AZ 5214E using different exposure equipment:'''
'''Resolution at optimal processing conditions for 1.5µm AZ 5214E using different exposure equipment:'''
{| class="wikitable"
{| class="wikitable"
|+
|+
!Exposure equipment
!Exposure equipment
!Dose
!Dose [mJ/cm<sup>2</sup>]
!Contact/Defoc
!Contact/Defoc
!Resolution
!Resolution [µm]
!Comment
!Comment
|-
|-
Line 31: Line 32:
|100
|100
|Vacuum
|Vacuum
|1µm
|1
|
|
|-
|-
Line 37: Line 38:
|100
|100
|Vacuum
|Vacuum
|1.25µm
|1.25
|Probably over-exposed
|Probably over-exposed
|-
|-
Line 43: Line 44:
|90
|90
|2
|2
|1.25µm
|1.25
|
|
|}
|}
<br clear="all" />
<br clear="all" />


'''SEM images from different exposure equipment:'''
'''SEM images from different exposure equipment for 1.5µm AZ 5214E at optimal processing conditions:'''


{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
Line 88: Line 89:
<br clear="all" />
<br clear="all" />


'''SEM images of different size structures:'''
'''SEM images of different size structures for 1.5µm AZ 5214E:'''


{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
Line 189: Line 190:


===Resist profile===
===Resist profile===
<br clear="all" />


====Linewidth and sidewall angle vs exposure dose====
====Linewidth and sidewall angle vs exposure dose====
<br clear="all" />


'''SEM images of 2µm triplets as a function of exposure dose:'''
'''SEM images of 1.5µm AZ 5214E as a function of exposure dose for Aligner: MA6-2 using vacuum contact:'''
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
|-
|-
Line 208: Line 211:
|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|Aligner: MA6-2
|2µm triplets
Vacuum contact
|[[Image:W14 MA62 5214E vac D85_H6B_01.jpg|280px]]
|[[Image:W14 MA62 5214E vac D85_H6B_01.jpg|280px]]
|[[Image:W14 MA62 5214E vac D90_H4B_01.jpg|280px]]
|[[Image:W14 MA62 5214E vac D90_H4B_01.jpg|280px]]
Line 215: Line 217:
|[[Image:W14 MA62 5214E vac D100_B4T_01.jpg|280px]]
|[[Image:W14 MA62 5214E vac D100_B4T_01.jpg|280px]]
|[[Image:W14 MA62 5214E vac D105_C6T_01.jpg|280px]]
|[[Image:W14 MA62 5214E vac D105_C6T_01.jpg|280px]]
|-
|-style="background:WhiteSmoke; color:black"
|Lines
|[[Image:W14 MA62 5214E vac D85_H6B_02.jpg|280px]]
|[[Image:W14 MA62 5214E vac D90_H4B_02.jpg|280px]]
|[[Image:W14 MA62 5214E vac D95_F3B_02.jpg|280px]]
|[[Image:W14 MA62 5214E vac D100_B4T_02.jpg|280px]]
|[[Image:W14 MA62 5214E vac D105_C6T_02.jpg|280px]]


|}
|}
<br clear="all" />
<br clear="all" />


'''SEM images of 1.5µm AZ 5214E as a function of exposure dose for Aligner: Maskless 02 (MLA2) using defoc 2:'''
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
|-
|-
Line 233: Line 245:
|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|Aligner: Maskless 02 (MLA2)
|2µm triplets
Defoc 2
|[[Image:W13 mla2 5214E D80 F2_02.jpg|280px]]
|[[Image:W13 mla2 5214E D80 F2_02.jpg|280px]]
|[[Image:W13 mla2 5214E D90 F2_05.jpg|280px]]
|[[Image:W13 mla2 5214E D90 F2_05.jpg|280px]]
|[[Image:W13 mla2 5214E D100 F2_01.jpg|280px]]
|[[Image:W13 mla2 5214E D100 F2_01.jpg|280px]]
|[[Image:W13 mla2 5214E D110 F2_01.jpg|280px]]
|[[Image:W13 mla2 5214E D110 F2_01.jpg|280px]]
|-
|-style="background:WhiteSmoke; color:black"
|Trenches <br>and Lines
|[[Image:W13 mla2 5214E D80 F2_01.jpg|280px]]
|[[Image:W13 mla2 5214E D90 F2_04.jpg|280px]]
|[[Image:W13 mla2 5214E D100 F2_02.jpg|280px]]
|[[Image:W13 mla2 5214E D110 F2_02.jpg|280px]]


|}
|}
Line 259: Line 278:


====Linewidth and sidewall angle vs defocus parameter====
====Linewidth and sidewall angle vs defocus parameter====
<br clear="all" />


'''SEM images as a function of defocus parameter for Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>:'''
'''SEM images of 1.5µm AZ 5214E as a function of defocus parameter for Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>:'''
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  
|-
|-
Line 317: Line 337:
|+
|+
!Exposure equipment
!Exposure equipment
!Dose
!Dose [mJ/cm<sup>2</sup>]
!Contact/Defoc
!Contact/Defoc
!Resolution
!Resolution [µm]
!Comment
!Comment
|-
|-
Line 325: Line 345:
|220
|220
|Vacuum
|Vacuum
|1µm
|1
|
|
|-
|-
Line 331: Line 351:
|275
|275
|2
|2
|1µm
|1
|
|
|}
<br clear="all" />
'''SEM images of 1.5µm AZ MiR 701 from different exposure equipment at optimal processing conditions:'''
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
|-
|-
|-style="background:silver; color:black"
!
!2µm triplets
!Lines
!Trenches
|-
|-
|-style="background:WhiteSmoke; color:black"
|Aligner: MA6-2
220mJ/cm<sup>2</sup>, vacuum contact
|[[Image:W18 MA62 MiR vac D220_I3T_03.jpg|400px]]
|[[Image:W18 MA62 MiR vac D220_I3T_02.jpg|400px]]
|[[Image:W18 MA62 MiR vac D220_I3T_01.jpg|400px]]
|-
|-style="background:WhiteSmoke; color:black"
|Aligner: Maskless 02 (MLA2)
275mJ/cm<sup>2</sup>, defoc 2
|[[Image:W15 MLA2 MiR F2 D275_03.jpg|400px]]
|[[Image:W15 MLA2 MiR F2 D275_02.jpg|400px]]
|[[Image:W15 MLA2 MiR F2 D275_01.jpg|400px]]
|}
|}
<br clear="all" />
<br clear="all" />
Line 339: Line 391:
*SEM pictures to support graphs?
*SEM pictures to support graphs?


[[Image:MiR_Linewidth vs dose.jpg|left|500px|thumb|Width of 2µm line vs. exposure dose for 1.5µm AZ MiR 701. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).]]
'''Result of image analysis of SEM images of 2µm triplets:'''


[[Image:MiR_Sidewall vs dose.jpg|left|500px|thumb|Sidewall angle vs. exposure dose for 1.5µm AZ MiR 701. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).]]
{| cellpadding="2" style="border: 2px solid darkgray;" align="left"
! width="510" | 


[[Image:MiR_Profile vs defoc.jpg|left|500px|thumb|Linewidth and sidewall angle vs. defocus value  for 1.5µm AZ MiR 701 exposed in Aligner: Maskless 02 (MLA2) using dose 275mJ/cm<sup>2</sup>. <br>Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.]]
|+
|- border="0" align="center"
|[[Image:MiR_Linewidth vs dose.jpg|500px]]
|[[Image:MiR_Sidewall vs dose.jpg|500px]]
 
|- align="center"
| colspan="2" | Width of 2µm line and sidewall angle vs. exposure dose for 1.5µm AZ MiR 701. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2). 
|}
<br clear="all" />
 
'''Result of image analysis of SEM images of 2µm triplets:'''
{| cellpadding="2" style="border: 2px solid darkgray;" align="left"
! width="510" |
 
|+
|- border="0" align="center"
|[[Image:MiR_Profile vs defoc.jpg|500px]]
 
|- align="center"
| Linewidth and sidewall angle vs. defocus value  for 1.5µm AZ MiR 701 exposed in Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>. <br>Blue circles: Width of 2µm line. <br>Orange Squares: Sidewall angle.


|}
<br clear="all" />
<br clear="all" />


==AZ nLOF 2020==
==AZ nLOF 2020==
===Resolution===
===Resolution===
* Table with optimal parameters and resolution for different aligners
<br clear="all" />
* SEM pictures
 
'''Resolution at optimal processing conditions for 2µm AZ nLOF 2020 using different exposure equipment:'''
{| class="wikitable"
|+
!Exposure equipment
!Dose [mJ/cm<sup>2</sup>]
!Contact/Defoc
!Resolution [µm]
!Comment
|-
|Aligner: MA6-2
|154
|Vacuum
|1
|
|-
|Aligner: Maskless 01 (MLA1)
|220
| -4
|2
|
|-
|Aligner: Maskless 02 (MLA2)
|450
|0
|1.25
|
|}
<br clear="all" />
 
'''SEM images of 2µm AZ nLOF 2020 from different exposure equipment at optimal processing conditions:'''
 
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
|-
 
|-
|-style="background:silver; color:black"
!
!2µm triplets
!Lines
!Trenches
|-
 
|-
|-style="background:WhiteSmoke; color:black"
|Aligner: MA6-2
154mJ/cm<sup>2</sup>, vacuum contact
|[[Image:W07 MA6 nLOF D154 vac C8T_01.jpg|400px]]
|[[Image:W07 MA6 nLOF D154 vac C8T_??.jpg|400px]]
|[[Image:W07 MA6 nLOF D154 vac C8T_??.jpg|400px]]
 
|-
|-style="background:WhiteSmoke; color:black"
|Aligner: Maskless 01 (MLA1)
220mJ/cm<sup>2</sup>, Defoc -4
|[[Image:W06 MLA1 nLOF D220 F-4_01.jpg|400px]]
|[[Image:W06 MLA1 nLOF D220 F-4_??.jpg|400px]]
|[[Image:W06 MLA1 nLOF D220 F-4_??.jpg|400px]]
 
|-
|-style="background:WhiteSmoke; color:black"
|Aligner: Maskless 02 (MLA2)
450mJ/cm<sup>2</sup>, defoc 0
|[[Image:W17 mla2 nLOF D450 F0_04.jpg|400px]]
|[[Image:W17 mla2 nLOF D450 F0_??.jpg|400px]]
|[[Image:W17 mla2 nLOF D450 F0_??.jpg|400px]]
 
|}
<br clear="all" />
 
'''SEM images of different size structures for 2µm AZ nLOF 2020:'''
 
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
|-
 
|-
|-style="background:silver; color:black"
!
!1µm triplets
!2µm triplets
!4µm triplets
|-
 
|-
|-style="background:WhiteSmoke; color:black"
|Aligner: MA6-2
154mJ/cm<sup>2</sup>, vacuum contact
|[[Image:W07 MA6 nLOF D154 vac C8T_05.jpg|400px]]
|[[Image:W07 MA6 nLOF D154 vac C8T_01.jpg|400px]]
|[[Image:W07 MA6 nLOF D154 vac C8T_02.jpg|400px]]
 
|-
|-style="background:WhiteSmoke; color:black"
|Aligner: Maskless 01 (MLA1)
220mJ/cm<sup>2</sup>, Defoc -4
|[[Image:W06 MLA1 nLOF D220 F-4_02.jpg|400px]]
|[[Image:W06 MLA1 nLOF D220 F-4_01.jpg|400px]]
|[[Image:W06 MLA1 nLOF D220 F-4_03.jpg|400px]]
 
|}
<br clear="all" />
 
'''Cross-sectional SEM images of 2µm AZ nLOF 2020 at optimal processing conditions:'''
{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"
|-
 
|-
|-style="background:silver; color:black"
!
!2µm lines
!2µm trenches
!Lines
!Trenches
|-
 
|-
|-style="background:WhiteSmoke; color:black"
|Aligner: Maskless 01 (MLA1)
220mJ/cm<sup>2</sup>, Defoc -4
|[[Image:w04_mla1_nLOF_D220_F-4_X_l_2um.jpg|280px]]
|[[Image:w04_mla1_nLOF_D220_F-4_X_t_2um.jpg|280px]]
|[[Image:w04_mla1_nLOF_D220_F-4_Xlines.jpg|280px]]
|[[Image:w04_mla1_nLOF_D220_F-4_Xtrench.jpg|280px]]
 
|}
<br clear="all" />


===Resist profile (sidewall angle and linewidth)===
===Resist profile (sidewall angle and linewidth)===
*SEM pictures to support graphs?
*SEM pictures to support graphs?


[[Image:nLOF_Linewidth vs dose.jpg|left|500px|thumb|Width of 2µm line vs. exposure dose for 2µm AZ nLOF 2020. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 01 (MLA1) using defoc -4 (QC defoc=-2). <br>Grey triangles: Exposed on Aligner: Maskless 02 (MLA2) using defoc 0 (QC defoc=2).]]
'''Result of image analysis of SEM images of 2µm triplets:'''
 
{| cellpadding="2" style="border: 2px solid darkgray;" align="left"
! width="510" | 
 
|+
|- border="0" align="center"
|[[Image:nLOF_Linewidth vs dose.jpg|500px]]
|[[Image:nLOF_Sidewall vs dose.jpg|500px]]
 
|- align="center"
| colspan="2" | Sidewall angle vs. exposure dose for 2µm AZ nLOF 2020. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 01 (MLA1) using defoc -4 (QC defoc=-2). <br>Grey triangles: Exposed on Aligner: Maskless 02 (MLA2) using defoc 0 (QC defoc=2).
|}
<br clear="all" />


[[Image:nLOF_Sidewall vs dose.jpg|left|500px|thumb|Sidewall angle vs. exposure dose for 2µm AZ nLOF 2020. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 01 (MLA1) using defoc -4 (QC defoc=-2). <br>Grey triangles: Exposed on Aligner: Maskless 02 (MLA2) using defoc 0 (QC defoc=2).]]
'''Result of image analysis of SEM images of 2µm triplets:'''


[[Image:nLOF_MLA1_Profile vs defoc.jpg|left|500px|thumb|Linewidth and sidewall angle vs. defocus value for 2µm AZ nLOF exposed in Aligner: Maskless 01 (MLA1) using dose 220mJ/cm<sup>2</sup>. <br>Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.]]
{| cellpadding="2" style="border: 2px solid darkgray;" align="left"
! width="510" |   


[[Image:nLOF_MLA2_Profile vs defoc.jpg|left|500px|thumb|Linewidth and sidewall angle vs. defocus value  for 2µm AZ nLOF exposed in Aligner: Maskless 02 (MLA2) using dose 450mJ/cm<sup>2</sup>. <br>Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.]]
|+
|- border="0" align="center"
|[[Image:nLOF_MLA1_Profile vs defoc.jpg|500px]]
|[[Image:nLOF_MLA2_Profile vs defoc.jpg|500px]]


|- align="center"
| colspan="2" | Linewidth and sidewall angle vs. defocus value  for 2µm AZ nLOF <br>exposed in Aligner: Maskless 01 (MLA1) using dose 220mJ/cm<sup>2</sup> and Aligner: Maskless 02 (MLA2) using dose 450mJ/cm<sup>2</sup>, respectively. <br>Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.
|}
<br clear="all" />
<br clear="all" />

Latest revision as of 14:42, 17 June 2026

The content on this page, including all images and pictures, was created by DTU Nanolab staff, unless otherwise stated.

Feedback to this page: click here

Mask Aligner vs Maskless Aligner

Slides presented at NNUM in Uppsala 2026: MA6 vs MLA 2026_v09

Mask design used in the investigation: LithoTestAlign_2025_v10.gds

Data from the investigation

THIS PAGE IS UNDER CONSTRUCTION

AZ 5214E

Resolution


Resolution at optimal processing conditions for 1.5µm AZ 5214E using different exposure equipment:

Exposure equipment Dose [mJ/cm2] Contact/Defoc Resolution [µm] Comment
Aligner: MA6-2 100 Vacuum 1
Aligner: MA6-1 100 Vacuum 1.25 Probably over-exposed
Aligner: Maskless 02 (MLA2) 90 2 1.25


SEM images from different exposure equipment for 1.5µm AZ 5214E at optimal processing conditions:

2µm triplets Lines Trenches
Aligner: MA6-2

100mJ/cm2, vacuum contact

Aligner: MA6-1

100mJ/cm2, vacuum contact
(probably over-exposed)

Aligner: Maskless 02 (MLA2)

90mJ/cm2, defoc 2


SEM images of different size structures for 1.5µm AZ 5214E:

1µm triplets 2µm triplets 4µm triplets
Aligner: MA6-1

100mJ/cm2, vacuum contact
(probably over-exposed)


Yield

The yield is measured by inspecting all 116 lithographic resolution test structures in an optical microscope and recording the smallest resolved dots and lines.

Wafer maps at optimal processing conditions for different aligners
Aligner: Maskless 02 (MLA2) (Dose 90mJ/cm2; defoc 2).
Resolution: 1.22µm average; 0.1µm standard deviation.
Yield at 1.25µm: 99%		 Aligner: MA6-2 (Dose 100mJ/cm2; vacuum contact).
Resolution: 1.02µm average; 0.1µm standard deviation.
Yield at 1.25µm: 100%		 Aligner: MA6-1 (Dose 100mJ/cm2; vacuum contact). Probably over-exposed.
Resolution: 1.30µm average; 0.2µm standard deviation.
Yield at 1.25µm: 59%


Effect of exposure mode for mask aligner

Wafer maps at different exposure modes for Aligner: MA6-2 (Dose 100mJ/cm2)
Hard contact.
Resolution: 1.17µm average; 0.2µm standard deviation.
Yield at 1.25µm: 89%		 Soft contact.
Resolution: 3.77µm average; 0.7µm standard deviation.
Yield at 2.5µm: 4%		 10µm proximity.
Resolution: 4.19µm average; 0.7µm standard deviation.
Yield at 2.5µm: 3%


Wafer maps at different exposure modes for Aligner: MA6-1 (Dose 100mJ/cm2, probably over-exposed)
Hard contact.
Resolution: 1.58µm average; 0.5µm standard deviation.
Yield at 1.25µm: 48%		 Soft contact.
Resolution: 2.36µm average; 0.4µm standard deviation.
Yield at 2.5µm: 80%
At dose 92mJ/cm2, the average resolution decreases to 1.91µm and the yield at 2.5µm increases to 100%		 10µm proximity.
Resolution: 2.73µm average; 0.6µm standard deviation.
Yield at 2.5µm: 53%


Effect of WEC pressure for mask aligner (after WEC head service)

Wafer maps at different WEC pressure for Aligner: MA6-2 (Dose 100mJ/cm2)
Soft contact, 0.15bar WEC pressure.
Resolution: 3.92µm average; 0.9µm standard deviation.
Yield at 2.5µm: 8%		 Soft contact, 0.40bar WEC pressure.
Resolution: 2.19µm average; 0.5µm standard deviation.
Yield at 2.5µm: 86%
10µm proximity, 0.15bar WEC pressure.
Resolution: 3.22µm average; 0.8µm standard deviation.
Yield at 2.5µm: 34%		 10µm proximity, 0.40bar WEC pressure.
Resolution: 2.83µm average; 0.6µm standard deviation.
Yield at 2.5µm: 66%


Resist profile


Linewidth and sidewall angle vs exposure dose


SEM images of 1.5µm AZ 5214E as a function of exposure dose for Aligner: MA6-2 using vacuum contact:

85mJ/cm2 90mJ/cm2 95mJ/cm2 100mJ/cm2 105mJ/cm2
2µm triplets
Lines


SEM images of 1.5µm AZ 5214E as a function of exposure dose for Aligner: Maskless 02 (MLA2) using defoc 2:

80mJ/cm2 90mJ/cm2 100mJ/cm2 110mJ/cm2
2µm triplets
Trenches
and Lines


Result of image analysis of SEM images of 2µm triplets:

Width of 2µm line and sidewall angle vs. exposure dose for 1.5µm AZ 5214E.
Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).


Linewidth and sidewall angle vs defocus parameter


SEM images of 1.5µm AZ 5214E as a function of defocus parameter for Aligner: Maskless 02 (MLA2) using dose 95mJ/cm2:

Defoc -8 Defoc -1 Defoc 2 Defoc 5 Defoc 12
2µm triplets
Lines


Result of image analysis of SEM images of 2µm triplets:

Linewidth and sidewall angle vs. defocus value for 1.5µm AZ 5214E exposed in Aligner: Maskless 02 (MLA2) using dose 95mJ/cm2.
Blue circles: Width of 2µm line.
Orange Squares: Sidewall angle.


AZ MiR 701

Resolution

  • Table with optimal parameters and resolution for different aligners
  • SEM pictures

Resolution at optimal processing conditions for 1.5µm AZ MiR 701 using different exposure equipment:

Exposure equipment Dose [mJ/cm2] Contact/Defoc Resolution [µm] Comment
Aligner: MA6-2 220 Vacuum 1
Aligner: Maskless 02 (MLA2) 275 2 1


SEM images of 1.5µm AZ MiR 701 from different exposure equipment at optimal processing conditions:

2µm triplets Lines Trenches
Aligner: MA6-2

220mJ/cm2, vacuum contact

Aligner: Maskless 02 (MLA2)

275mJ/cm2, defoc 2


Resist profile (sidewall angle and linewidth)

  • SEM pictures to support graphs?

Result of image analysis of SEM images of 2µm triplets:

Width of 2µm line and sidewall angle vs. exposure dose for 1.5µm AZ MiR 701.
Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).


Result of image analysis of SEM images of 2µm triplets:

Linewidth and sidewall angle vs. defocus value for 1.5µm AZ MiR 701 exposed in Aligner: Maskless 02 (MLA2) using dose 95mJ/cm2.
Blue circles: Width of 2µm line.
Orange Squares: Sidewall angle.


AZ nLOF 2020

Resolution


Resolution at optimal processing conditions for 2µm AZ nLOF 2020 using different exposure equipment:

Exposure equipment Dose [mJ/cm2] Contact/Defoc Resolution [µm] Comment
Aligner: MA6-2 154 Vacuum 1
Aligner: Maskless 01 (MLA1) 220 -4 2
Aligner: Maskless 02 (MLA2) 450 0 1.25


SEM images of 2µm AZ nLOF 2020 from different exposure equipment at optimal processing conditions:

2µm triplets Lines Trenches
Aligner: MA6-2

154mJ/cm2, vacuum contact

File:W07 MA6 nLOF D154 vac C8T 01.jpg File:W07 MA6 nLOF D154 vac C8T ??.jpg File:W07 MA6 nLOF D154 vac C8T ??.jpg
Aligner: Maskless 01 (MLA1)

220mJ/cm2, Defoc -4

File:W06 MLA1 nLOF D220 F-4 01.jpg File:W06 MLA1 nLOF D220 F-4 ??.jpg File:W06 MLA1 nLOF D220 F-4 ??.jpg
Aligner: Maskless 02 (MLA2)

450mJ/cm2, defoc 0

File:W17 mla2 nLOF D450 F0 04.jpg File:W17 mla2 nLOF D450 F0 ??.jpg File:W17 mla2 nLOF D450 F0 ??.jpg


SEM images of different size structures for 2µm AZ nLOF 2020:

1µm triplets 2µm triplets 4µm triplets
Aligner: MA6-2

154mJ/cm2, vacuum contact

File:W07 MA6 nLOF D154 vac C8T 05.jpg File:W07 MA6 nLOF D154 vac C8T 01.jpg File:W07 MA6 nLOF D154 vac C8T 02.jpg
Aligner: Maskless 01 (MLA1)

220mJ/cm2, Defoc -4

File:W06 MLA1 nLOF D220 F-4 02.jpg File:W06 MLA1 nLOF D220 F-4 01.jpg File:W06 MLA1 nLOF D220 F-4 03.jpg


Cross-sectional SEM images of 2µm AZ nLOF 2020 at optimal processing conditions:

2µm lines 2µm trenches Lines Trenches
Aligner: Maskless 01 (MLA1)

220mJ/cm2, Defoc -4

File:W04 mla1 nLOF D220 F-4 X l 2um.jpg File:W04 mla1 nLOF D220 F-4 X t 2um.jpg File:W04 mla1 nLOF D220 F-4 Xlines.jpg File:W04 mla1 nLOF D220 F-4 Xtrench.jpg


Resist profile (sidewall angle and linewidth)

  • SEM pictures to support graphs?

Result of image analysis of SEM images of 2µm triplets:

Sidewall angle vs. exposure dose for 2µm AZ nLOF 2020.
Blue circles: Exposed on Aligner: MA6-2 in vacuum contact.
Orange Squares: Exposed on Aligner: Maskless 01 (MLA1) using defoc -4 (QC defoc=-2).
Grey triangles: Exposed on Aligner: Maskless 02 (MLA2) using defoc 0 (QC defoc=2).


Result of image analysis of SEM images of 2µm triplets:

Linewidth and sidewall angle vs. defocus value for 2µm AZ nLOF
exposed in Aligner: Maskless 01 (MLA1) using dose 220mJ/cm2 and Aligner: Maskless 02 (MLA2) using dose 450mJ/cm2, respectively.
Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.


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