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Mask Aligner vs Maskless Aligner

Slides presented at NNUM in Uppsala 2026: MA6 vs MLA 2026_v09

Mask design used in the investigation: LithoTestAlign_2025_v10.gds

Additional data

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AZ 5214E

Resolution

Resolution at optimal processing conditions for different exposure equipment:


Exposure equipment	Dose	Contact/Defoc	Resolution	Comment
Aligner: MA6-2	100	Vacuum	1µm
Aligner: MA6-1	100	Vacuum	1.25µm	Probably over-exposed
Aligner: Maskless 02 (MLA2)	90	2	1.25µm

SEM images from different exposure equipment:

	2µm triplets	Lines	Trenches
Aligner: MA6-2 100mJ/cm², vacuum contact
Aligner: MA6-1 100mJ/cm², vacuum contact (probably over-exposed)
Aligner: Maskless 02 (MLA2) 90mJ/cm², defoc 2

SEM images of different size structures:

	1µm triplets	2µm triplets	4µm triplets
Aligner: MA6-1 100mJ/cm², vacuum contact (probably over-exposed)

Yield

The yield is measured by inspecting all 116 lithographic resolution test structures in an optical microscope and recording the smallest resolved dots and lines.

**Wafer maps at optimal processing conditions for different aligners**


Aligner: Maskless 02 (MLA2) (Dose 90mJ/cm²; defoc 2). Resolution: 1.22µm average; 0.1µm standard deviation. Yield at 1.25µm: 99%	Aligner: MA6-2 (Dose 100mJ/cm²; vacuum contact). Resolution: 1.02µm average; 0.1µm standard deviation. Yield at 1.25µm: 100%	Aligner: MA6-1 (Dose 100mJ/cm²; vacuum contact). Probably over-exposed. Resolution: 1.30µm average; 0.2µm standard deviation. Yield at 1.25µm: 59%

Effect of exposure mode for mask aligner

**Wafer maps at different exposure modes for Aligner: MA6-2 (Dose 100mJ/cm²)**


Hard contact. Resolution: 1.17µm average; 0.2µm standard deviation. Yield at 1.25µm: 89%	Soft contact. Resolution: 3.77µm average; 0.7µm standard deviation. Yield at 2.5µm: 4%	10µm proximity. Resolution: 4.19µm average; 0.7µm standard deviation. Yield at 2.5µm: 3%

**Wafer maps at different exposure modes for Aligner: MA6-1 (Dose 100mJ/cm², probably over-exposed)**


Hard contact. Resolution: 1.58µm average; 0.5µm standard deviation. Yield at 1.25µm: 48%	Soft contact. Resolution: 2.36µm average; 0.4µm standard deviation. Yield at 2.5µm: 80% At dose 92mJ/cm², the average resolution decreases to 1.91µm and the yield at 2.5µm increases to 100%	10µm proximity. Resolution: 2.73µm average; 0.6µm standard deviation. Yield at 2.5µm: 53%

Effect of WEC pressure for mask aligner (after WEC head service)

**Wafer maps at different WEC pressure for Aligner: MA6-2 (Dose 100mJ/cm²)**


Soft contact, 0.15bar WEC pressure. Resolution: 3.92µm average; 0.9µm standard deviation. Yield at 2.5µm: 8%	Soft contact, 0.40bar WEC pressure. Resolution: 2.19µm average; 0.5µm standard deviation. Yield at 2.5µm: 86%

10µm proximity, 0.15bar WEC pressure. Resolution: 3.22µm average; 0.8µm standard deviation. Yield at 2.5µm: 34%	10µm proximity, 0.40bar WEC pressure. Resolution: 2.83µm average; 0.6µm standard deviation. Yield at 2.5µm: 66%

Resist profile

Linewidth and sidewall angle vs exposure dose

SEM images of 2µm triplets as a function of exposure dose:

	85mJ/cm²	90mJ/cm²	95mJ/cm²	100mJ/cm²	105mJ/cm²
Aligner: MA6-2 Vacuum contact

	80mJ/cm²	90mJ/cm²	100mJ/cm²	110mJ/cm²
Aligner: Maskless 02 (MLA2) Defoc 2

Result of image analysis of SEM images of 2µm triplets:




Width of 2µm line and sidewall angle vs. exposure dose for 1.5µm AZ 5214E. Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).

Linewidth and sidewall angle vs defocus parameter

SEM images as a function of defocus parameter for Aligner: Maskless 02 (MLA2) using dose 95mJ/cm²:

	Defoc -8	Defoc -1	Defoc 2	Defoc 5	Defoc 12
2µm triplets
Lines

Result of image analysis of SEM images of 2µm triplets:




Linewidth and sidewall angle vs. defocus value for 1.5µm AZ 5214E exposed in Aligner: Maskless 02 (MLA2) using dose 95mJ/cm². Blue circles: Width of 2µm line. Orange Squares: Sidewall angle.

AZ MiR 701

Resolution

Table with optimal parameters and resolution for different aligners
SEM pictures

Resist profile (sidewall angle and linewidth)

SEM pictures to support graphs?

AZ nLOF 2020

Resolution

Table with optimal parameters and resolution for different aligners
SEM pictures

Resist profile (sidewall angle and linewidth)

SEM pictures to support graphs?

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-| colspan="2" | Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).
+| colspan="2" | Width of 2µm line and sidewall angle vs. exposure dose for 1.5µm AZ 5214E. <br>Blue circles: Exposed on Aligner: MA6-2 in vacuum contact. <br>Orange Squares: Exposed on Aligner: Maskless 02 (MLA2) using defoc 2 (QC defoc=2).
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+====Linewidth and sidewall angle vs defocus parameter====
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-|+'''Linewidth and sidewall angle vs. defocus value  for 1.5µm AZ 5214E exposed in Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>.'''
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-| Blue circles: Width of 2µm line. <br>Orange Squares: Sidewall angle.
+| Linewidth and sidewall angle vs. defocus value  for 1.5µm AZ 5214E exposed in Aligner: Maskless 02 (MLA2) using dose 95mJ/cm<sup>2</sup>. <br>Blue circles: Width of 2µm line. <br>Orange Squares: Sidewall angle.
 |}