Specific Process Knowledge/Lithography/Development/manualTMAH developer: Difference between revisions
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{| class="wikitable" | {| class="wikitable" | ||
! style="text-align:left" | Product | ! style="text-align:left" | Product | ||
| style="padding-left: 10px" | Laurell EDC-650-HZB-23NP | | style="padding-left: 10px" | Laurell EDC-650-HZB-23NP | ||
|- | |- | ||
! style="text-align:left" | Year of purchase | ! style="text-align:left" | Year of purchase | ||
| style="padding-left: 10px" | 2016 | | style="padding-left: 10px" | 2016 | ||
|- | |- | ||
! style="text-align:left" | Tool modification | ! style="text-align:left" | Tool modification | ||
| style="padding-left: 10px" | | | style="padding-left: 10px" | | ||
Converted from e-beam solvent developer to UV TMAH developer in 2024<br> | Converted from e-beam solvent developer to UV TMAH developer in 2024<br> | ||
Added media flow controllers for developer, rinse and | Added media flow controllers for developer, rinse and drying media in 2025 | ||
|- | |- | ||
! style="text-align:left" | Location | ! style="text-align:left" | Location | ||
| style="padding-left: 10px" | Cleanroom E-4 | | style="padding-left: 10px" | Cleanroom E-4 | ||
|} | |} | ||