Specific Process Knowledge/Characterization/Dektak XTA: Difference between revisions
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=Dektak XTA (Stylus Profiler)= | =Dektak XTA (Stylus Profiler)= | ||
[[image:Dektak XTA new.JPG|275x275px|right|thumb|Dektak XTA. Now in cleanroom C-1, at time of photo it was somewhere else.]] | |||
The Dektak XTA stylus profiler from Brüker is used for profiling surfaces of samples with structures in the micro- and nanometer range. The size of the structures that can be measured is limited by the tip dimensions. | The Dektak XTA stylus profiler from Brüker is used for profiling surfaces of samples with structures in the micro- and nanometer range. The size of the structures that can be measured is limited by the tip dimensions. | ||
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A profile measurement can be done across a specific structure by using a high magnification camera to locate the structure. It is also possible to program the stylus to measure in several positions, defined with respect to some deskew points. [[Specific_Process_Knowledge/Characterization/Stress_measurement|Stress measurements]] of thin films can be done by measuring the wafer bow. However, for predefined measurement programs or stress measurements, we recommend the [[Specific_Process_Knowledge/Characterization/Tencor_P17|P17 profiler]]. | A profile measurement can be done across a specific structure by using a high magnification camera to locate the structure. It is also possible to program the stylus to measure in several positions, defined with respect to some deskew points. [[Specific_Process_Knowledge/Characterization/Stress_measurement|Stress measurements]] of thin films can be done by measuring the wafer bow. However, for predefined measurement programs or stress measurements, we recommend the [[Specific_Process_Knowledge/Characterization/Tencor_P17|P17 profiler]]. | ||
The user manual, quality control procedure and results, technical information and contact information can be found in [http://labmanager.nanolab.dtu.dk/function.php?module=Machine&view=view&mach=304 '''LabManager''']. | |||
The user manual, quality control procedure and results, technical information and contact information can be found in [http://labmanager. | |||
<br> | <br> | ||
Information on measurement accuracy and reproducibility for the stylus profilers may be found [[Specific Process Knowledge/Characterization/Stylus Profiler Measurement Uncertainty|here]] | Information on measurement accuracy and reproducibility for the stylus profilers may be found [[Specific Process Knowledge/Characterization/Stylus Profiler Measurement Uncertainty|here]]. | ||
<br> | <br> | ||
==Performance and Process Parameters== | ==Performance and Process Parameters== | ||
{| border="2" cellspacing="0" cellpadding="10" | {| border="2" cellspacing="0" cellpadding="10" | ||
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|style="background:LightGrey; color:black"|Scan range x y | |style="background:LightGrey; color:black"|Scan range x y | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
Line scan | * Line scan: 50 µm to 55 mm in a single scan | ||
* Up to 200 mm with stiching | |||
|- | |- | ||
|style="background:LightGrey; color:black"|Scan range z | |style="background:LightGrey; color:black"|Scan range z | ||
| Line 41: | Line 41: | ||
|style="background:LightGrey; color:black"|Resolution x y | |style="background:LightGrey; color:black"|Resolution x y | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
Down to 0.003 µm theoretically, in practice limited by | Down to 0.003 µm theoretically, in practice limited by tip radius | ||
|- | |- | ||
|style="background:LightGrey; color:black"|Resolution z | |style="background:LightGrey; color:black"|Resolution z | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
1 Å, 10 Å, 80 Å or 160 Å | 1 Å, 10 Å, 80 Å or 160 Å for ranges 65 kÅ, 655 kÅ, 5240 kÅ and 1 mm respectively | ||
|- | |- | ||
|style="background:LightGrey; color:black"|Height accuracy z (95 % confidence) | |style="background:LightGrey; color:black"|Height accuracy z (95 % confidence) | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
~ 2 % for a 1 µm step with the | *~ 2 % for a 1 µm step with the 65 kÅ range | ||
*~ 1 % for a 25 µm step | |||
*''for well-defined steps that are easy to measure.'' | |||
*[[Specific Process Knowledge/Characterization/Stylus Profiler Measurement Uncertainty|More info here]] | |||
|- | |- | ||
|style="background:LightGrey; color:black"|Max scan depth as a function of trench width W | |style="background:LightGrey; color:black"|Max scan depth as a function of trench width W | ||
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*5 µm 45<sup>o</sup> cone | *5 µm 45<sup>o</sup> cone | ||
|- | |- | ||
!style="background:silver; color:black" align="left" rowspan="5" valign="top" |Substrates | !style="background:silver; color:black" align="left" rowspan="5" valign="top" |Substrates and films | ||
|style="background:LightGrey; color:black"|Substrate size | |style="background:LightGrey; color:black"|Substrate size | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*Up to 6" | *Up to 6" | ||
|- | |- | ||
| style="background:LightGrey; color:black"| | | style="background:LightGrey; color:black"|Materials allowed | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*All materials that do not stick to the tip or leave residues | *All materials that do not stick to the tip or leave residues | ||
*For very soft polymers we recommend the [[Specific Process Knowledge/Characterization/Topographic measurement#Comparison of Stylus Profilers, Optical Profilers and AFMs at Nanolab| Dektak 150]]. | *For very soft polymers we recommend the [[Specific Process Knowledge/Characterization/Topographic measurement#Comparison of Stylus Profilers, Optical Profilers and AFMs at Nanolab| Dektak 150]]. | ||
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|} | |} | ||
Latest revision as of 12:33, 7 July 2025
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Dektak XTA (Stylus Profiler)
The Dektak XTA stylus profiler from Brüker is used for profiling surfaces of samples with structures in the micro- and nanometer range. The size of the structures that can be measured is limited by the tip dimensions.
A profile measurement can be done across a specific structure by using a high magnification camera to locate the structure. It is also possible to program the stylus to measure in several positions, defined with respect to some deskew points. Stress measurements of thin films can be done by measuring the wafer bow. However, for predefined measurement programs or stress measurements, we recommend the P17 profiler.
The user manual, quality control procedure and results, technical information and contact information can be found in LabManager.
Information on measurement accuracy and reproducibility for the stylus profilers may be found here.
Performance and Process Parameters
| Purpose | Profiler for measuring micro structures |
|
|---|---|---|
| Performance | Scan range x y |
|
| Scan range z |
50 Å to 1 mm | |
| Resolution x y |
Down to 0.003 µm theoretically, in practice limited by tip radius | |
| Resolution z |
1 Å, 10 Å, 80 Å or 160 Å for ranges 65 kÅ, 655 kÅ, 5240 kÅ and 1 mm respectively | |
| Height accuracy z (95 % confidence) |
| |
| Max scan depth as a function of trench width W |
1.2*(W[µm]-5µm) | |
| Hardware settings | Tip radius |
|
| Substrates and films | Substrate size |
|
| Materials allowed |
|