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Dektak XTA (Stylus Profiler)

The Dektak XTA stylus profiler from Brüker is used for profiling surfaces of samples with structures in the micro- and nanometer range. The size of the structures that can be measured is limited by the tip dimensions.

A profile measurement can be done across a specific structure by using a high magnification camera to locate the structure. It is also possible to program the stylus to measure in several positions, defined with respect to some deskew points. Stress measurements of thin films can be done by measuring the wafer bow. However, for predefined measurement programs or stress measurements, we recommend the P17 profiler.

The user manual, quality control procedure and results, technical information and contact information can be found in LabManager.

Information on measurement accuracy and reproducibility for the stylus profilers may be found here.

Performance and Process Parameters

Purpose	Profiler for measuring micro structures	Single line profiles Wafer mapping Stress measurements by measuring wafer bow Surface roughness on a line scan
Performance	Scan range x y	Line scan: 50 µm to 55 mm in a single scan Up to 200 mm with stiching
	Scan range z	50 Å to 1 mm
	Resolution x y	Down to 0.003 µm theoretically, in practice limited by tip radius
	Resolution z	1 Å, 10 Å, 80 Å or 160 Å for ranges 65 kÅ, 655 kÅ, 5240 kÅ and 1 mm respectively
	Height accuracy z (95 % confidence)	~ 2 % for a 1 µm step with the 65 kÅ range ~ 1 % for a 25 µm step for well-defined steps that are easy to measure. More info here
	Max scan depth as a function of trench width W	1.2*(W[µm]-5µm)
Hardware settings	Tip radius	5 µm 45^o cone
Substrates and films	Substrate size	Up to 6"
	Materials allowed	All materials that do not stick to the tip or leave residues For very soft polymers we recommend the Dektak 150.

@@ Line 1: / Line 1: @@
-==Dektak XTA stylus profiler==
+{{cc-nanolab}}
-The Dektak XTA stylus profiler from Brüker is used for profiling surfaces of samples with structures in the micro- and nanometer range. The size of the structures that can be measured is limited by the tip dimensions.
+'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/Dektak_XTA click here]'''
+[[Category: Equipment|Characterization Profiler]]
+[[Category: Characterization|Profiler]]
-A profile measurement can be done across a specific structure by using a high magnification camera to locate the structure. It is also possible to program the stylus to measure in several positions, defined with respect to some deskew points. [[Specific_Process_Knowledge/Characterization/Stress_measurement|Stress measurements]] of thin films can be done by measuring the wafer bow. However, for predefined measurement programs or stress measurements, we recommend the P17 profiler - see next section.
+=Dektak XTA (Stylus Profiler)=
+[[image:Dektak XTA new.JPG|275x275px|right|thumb|Dektak XTA. Now in cleanroom C-1, at time of photo it was somewhere else.]]
-'''The user manual, quality control procedure and results, technical information and contact information can be found in LabManager:'''
+The Dektak XTA stylus profiler from Brüker is used for profiling surfaces of samples with structures in the micro- and nanometer range. The size of the structures that can be measured is limited by the tip dimensions.
-[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=304 Dektak XTA in LabManager]
+A profile measurement can be done across a specific structure by using a high magnification camera to locate the structure. It is also possible to program the stylus to measure in several positions, defined with respect to some deskew points. [[Specific_Process_Knowledge/Characterization/Stress_measurement|Stress measurements]] of thin films can be done by measuring the wafer bow. However, for predefined measurement programs or stress measurements, we recommend the [[Specific_Process_Knowledge/Characterization/Tencor_P17|P17 profiler]].
-Info about measurement accuracy can be found [[/Stylus profiler measurement uncertainty|here]].
+The user manual, quality control procedure and results, technical information and contact information can be found in [http://labmanager.nanolab.dtu.dk/function.php?module=Machine&view=view&mach=304 '''LabManager'''].
+<br>
-===Equipment performance and process related parameters===
+Information on measurement accuracy and reproducibility for the stylus profilers may be found [[Specific Process Knowledge/Characterization/Stylus Profiler Measurement Uncertainty|here]].
+<br>
-[[image:Dektak XTA new.JPG|275x275px|right|thumb|Dektak XTA. Now in cleanroom C-1, at time of photo it was somewhere else.]]
+==Performance and Process Parameters==
 {| border="2" cellspacing="0" cellpadding="10"
@@ Line 28: / Line 32: @@
 |style="background:LightGrey; color:black"|Scan range x y
 |style="background:WhiteSmoke; color:black"|
-Line scan x: 50 µm to 55 mm in a single scan, up to 200 mm with stiching
+* Line scan: 50 µm to 55 mm in a single scan
+* Up to 200 mm with stiching
 |-
 |style="background:LightGrey; color:black"|Scan range z
@@ Line 36: / Line 41: @@
 |style="background:LightGrey; color:black"|Resolution x y
 |style="background:WhiteSmoke; color:black"|
-Down to 0.003 µm theoretically, in practice limited by the tip radius
+Down to 0.003 µm theoretically, in practice limited by tip radius
 |-
 |style="background:LightGrey; color:black"|Resolution z
 |style="background:WhiteSmoke; color:black"|
-Å, 10 Å, 80 Å or 160 Å (for ranges 65 kÅ, 655 kÅ, 5240 kÅ and 1 mm respectively)
+Å, 10 Å, 80 Å or 160 Å for ranges 65 kÅ, 655 kÅ, 5240 kÅ and 1 mm respectively
 |-
 |style="background:LightGrey; color:black"|Height accuracy z (95 % confidence)
 |style="background:WhiteSmoke; color:black"|
-~ 2 % for a 1 µm step with the smallest measurement range and ~ 1 % for a 25 µm step ''for well-defined steps that are easy to measure'' (read about reducing and estimating the measurement uncertainty [[/Stylus profiler measurement uncertainty|here]])
+*~ 2 % for a 1 µm step with the 65 kÅ range
+*~ 1 % for a 25 µm step
+*''for well-defined steps that are easy to measure.''
+*[[Specific Process Knowledge/Characterization/Stylus Profiler Measurement Uncertainty|More info here]]
 |-
 |style="background:LightGrey; color:black"|Max scan depth as a function of trench width W
@@ Line 56: / Line 64: @@
 *5 µm 45<sup>o</sup> cone
 |-
-!style="background:silver; color:black" align="left" rowspan="5" valign="top" |Substrates
+!style="background:silver; color:black" align="left" rowspan="5" valign="top" |Substrates and films
 |style="background:LightGrey; color:black"|Substrate size
 |style="background:WhiteSmoke; color:black"|
 *Up to 6"
 |-
-| style="background:LightGrey; color:black"|Substrate materials allowed
+| style="background:LightGrey; color:black"|Materials allowed
 |style="background:WhiteSmoke; color:black"|
-*All materials that do not stick to the tip or leave residues on the chuck
+*All materials that do not stick to the tip or leave residues
-*For very soft polymers we recommend the Dektak 150, see below
+*For very soft polymers we recommend the [[Specific Process Knowledge/Characterization/Topographic measurement#Comparison of Stylus Profilers, Optical Profilers and AFMs at Nanolab| Dektak 150]].
 |-
 |}