Specific Process Knowledge/Characterization/Dektak XTA: Difference between revisions

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-==Dektak XTA stylus profiler==
+{{cc-nanolab}}
-The Dektak XTA stylus profiler from Brüker is used for profiling surfaces of samples with structures in the micro- and nanometer range. The size of the structures that can be measured is limited by the tip dimensions.
+'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/Dektak_XTA click here]'''
+[[Category: Equipment|Characterization Profiler]]
+[[Category: Characterization|Profiler]]
-A profile measurement can be done across a specific structure by using a high magnification camera to locate the structure. It is also possible to program the stylus to measure in several positions, defined with respect to some deskew points. [[Specific_Process_Knowledge/Characterization/Stress_measurement|Stress measurements]] of thin films can be done by measuring the wafer bow. However, for predefined measurement programs or stress measurements, we recommend the P17 profiler - see next section.
+=Dektak XTA (Stylus Profiler)=
+[[image:Dektak XTA new.JPG|275x275px|right|thumb|Dektak XTA. Now in cleanroom C-1, at time of photo it was somewhere else.]]
-'''The user manual, quality control procedure and results, technical information and contact information can be found in LabManager:'''
+The Dektak XTA stylus profiler from Brüker is used for profiling surfaces of samples with structures in the micro- and nanometer range. The size of the structures that can be measured is limited by the tip dimensions.
-[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=304 Dektak XTA in LabManager]
+A profile measurement can be done across a specific structure by using a high magnification camera to locate the structure. It is also possible to program the stylus to measure in several positions, defined with respect to some deskew points. [[Specific_Process_Knowledge/Characterization/Stress_measurement|Stress measurements]] of thin films can be done by measuring the wafer bow. However, for predefined measurement programs or stress measurements, we recommend the [[Specific_Process_Knowledge/Characterization/Tencor_P17|P17 profiler]].
-Info about measurement accuracy can be found [[/Stylus profiler measurement uncertainty|here]].
+The user manual, quality control procedure and results, technical information and contact information can be found in [http://labmanager.nanolab.dtu.dk/function.php?module=Machine&view=view&mach=304 '''LabManager'''].
+<br>
-===Equipment performance and process related parameters===
+Information on measurement accuracy and reproducibility for the stylus profilers may be found [[Specific Process Knowledge/Characterization/Stylus Profiler Measurement Uncertainty|here]].
+<br>
-[[image:Dektak XTA new.JPG|275x275px|right|thumb|Dektak XTA. Now in cleanroom C-1, at time of photo it was somewhere else.]]
+==Performance and Process Parameters==
 {| border="2" cellspacing="0" cellpadding="10"
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 |style="background:LightGrey; color:black"|Scan range x y
 |style="background:WhiteSmoke; color:black"|
-Line scan x: 50 µm to 55 mm in a single scan, up to 200 mm with stiching
+* Line scan: 50 µm to 55 mm in a single scan
+* Up to 200 mm with stiching
 |-
 |style="background:LightGrey; color:black"|Scan range z
@@ Line 36: / Line 41: @@
 |style="background:LightGrey; color:black"|Resolution x y
 |style="background:WhiteSmoke; color:black"|
-Down to 0.003 µm theoretically, in practice limited by the tip radius
+Down to 0.003 µm theoretically, in practice limited by tip radius
 |-
 |style="background:LightGrey; color:black"|Resolution z
 |style="background:WhiteSmoke; color:black"|
-Å, 10 Å, 80 Å or 160 Å (for ranges 65 kÅ, 655 kÅ, 5240 kÅ and 1 mm respectively)
+Å, 10 Å, 80 Å or 160 Å for ranges 65 kÅ, 655 kÅ, 5240 kÅ and 1 mm respectively
 |-
 |style="background:LightGrey; color:black"|Height accuracy z (95 % confidence)
 |style="background:WhiteSmoke; color:black"|
-~ 2 % for a 1 µm step with the smallest measurement range and ~ 1 % for a 25 µm step ''for well-defined steps that are easy to measure'' (read about reducing and estimating the measurement uncertainty [[/Stylus profiler measurement uncertainty|here]])
+*~ 2 % for a 1 µm step with the 65 kÅ range
+*~ 1 % for a 25 µm step
+*''for well-defined steps that are easy to measure.''
+*[[Specific Process Knowledge/Characterization/Stylus Profiler Measurement Uncertainty|More info here]]
 |-
 |style="background:LightGrey; color:black"|Max scan depth as a function of trench width W
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 *5 µm 45<sup>o</sup> cone
 |-
-!style="background:silver; color:black" align="left" rowspan="5" valign="top" |Substrates
+!style="background:silver; color:black" align="left" rowspan="5" valign="top" |Substrates and films
 |style="background:LightGrey; color:black"|Substrate size
 |style="background:WhiteSmoke; color:black"|
 *Up to 6"
 |-
-| style="background:LightGrey; color:black"|Substrate materials allowed
+| style="background:LightGrey; color:black"|Materials allowed
 |style="background:WhiteSmoke; color:black"|
-*All materials that do not stick to the tip or leave residues on the chuck
+*All materials that do not stick to the tip or leave residues
-*For very soft polymers we recommend the Dektak 150, see below
+*For very soft polymers we recommend the [[Specific Process Knowledge/Characterization/Topographic measurement#Comparison of Stylus Profilers, Optical Profilers and AFMs at Nanolab| Dektak 150]].
 |-
 |}