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LabAdviser/Technology Research/Fabrication of Hyperbolic Metamaterials using Atomic Layer Deposition/AZO pillars: Difference between revisions

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!1.3
!1.3
|LPCVD deposition of Si. (Optional step. Needs only if SOI substrates requires)
|LPCVD deposition of Si. (Optional step. Needs only if SOI substrates requires)
|LPCVD of amorphous silicon using [[Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_polysilicon/Deposition_of_polysilicon_using_LPCVD/Standard_recipes,_QC_limits_and_results_for_the_6"_polysilicon_furnace|AMORPOLY]] recipe in 6" Furnace LPCVD PolySilicon.
|LPCVD of amorphous silicon using [[Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon/Standard recipes, QC limits and results for the 6" polysilicon furnace|AMORPOLY]] recipe in 6" Furnace LPCVD PolySilicon.
|[[Specific_Process_Knowledge/Thin_film_deposition/Furnace_LPCVD_PolySilicon| 6" Furnace LPCVD PolySilicon]].
|[[Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon| 6" Furnace LPCVD PolySilicon]].
|[[image:3_1_SOI.jpg|250x350px|center|]]
|[[image:3_1_SOI.jpg|250x350px|center|]]
|-
|-
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