Specific Process Knowledge/Lithography/nLOF: Difference between revisions
No edit summary |
|||
| (3 intermediate revisions by the same user not shown) | |||
| Line 24: | Line 24: | ||
*PEB temperature: 110°C | *PEB temperature: 110°C | ||
*PEB time: 60 s | *PEB time: 60 s | ||
The recommended PEB for nLOF is 60 seconds at 110°C, regardless of resist film thickness. | The recommended PEB for nLOF is 60 seconds at 110°C, regardless of resist film thickness. | ||
===PEB baking time investigation=== | ===PEB baking time investigation=== | ||
| Line 42: | Line 40: | ||
===Solvent development=== | ===Solvent development=== | ||
Cross-linking negative resists have the potential to be developed using organic solvents instead of the normally used alkaline aqueous solutions. A | Cross-linking negative resists have the potential to be developed using organic solvents instead of the normally used alkaline aqueous solutions. A quick test of this was carried out by Thomas Anhøj @ DTU Nanolab, showing that nLOF 2020 could potentially be used for water-free lithography. | ||
A small report on the | A small report on the test can be found here: [[media:nLOF_solventdev_2024.pdf|'''nLOF solvent development 2024''']]. | ||