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{{cc-nanolab}}
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<i> Unless otherwise stated, this page is written by <b>DTU Nanolab internal</b></i>


[[Category: Equipment|Thin film LPCVD TEOS]]
[[Category: Equipment|Thin film LPCVD TEOS]]
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[[Category: Furnaces|LPCVD TEOS]]
[[Category: Furnaces|LPCVD TEOS]]


==LPCVD TEOS oxide==
==B3 LPCVD TEOS furnace==
[[Image:160904_danchip_4538.jpg|300x300px|thumb|B3 Furnace LPCVD TEOS. Positioned in cleanroom B-1]]
[[Image:160904_danchip_4538.jpg|300x300px|thumb|B3 LPCVD TEOS furnace. Positioned in cleanroom B-1]]


DTU Nanolab has one LPCVD (Low Pressure Chemical Vapor Deposition) TEOS furnace, in LabManager "Furnace: LPCVD TEOS (B3)".  
DTU Nanolab has one LPCVD (Low Pressure Chemical Vapor Deposition) TEOS furnace, in LabManager "Furnace: LPCVD TEOS (B3)".  
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More information about the TEOS oxide deposition process can be found here:
More information about the TEOS oxide deposition process can be found here:


[[Specific Process Knowledge/Thin film deposition/Deposition of TEOS/Deposition of TEOS using LPCVD|Deposition of TEOS oxide using LPCVD]]
[[Specific Process Knowledge/Thin film deposition/Furnace LPCVD TEOS|Deposition of TEOS oxide using LPCVD]]




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==Overview of the performance of the LPCVD TEOS furnace and some process related parameters==
==Overview of the performance of the LPCVD TEOS furnace and some process related parameters==


{| border="2" cellspacing="0" cellpadding="0"  
{| border="2" cellspacing="0" cellpadding="10"
|-
|-
!style="background:silver; color:black;" align="center"|Purpose  
!colspan="2" border="none" style="background:silver; color:black" align="center"|Purpose  
|style="background:LightGrey; color:black"|
|style="background:LightGrey; color:black"|'''Deposition of TEOS oxide'''
|style="background:WhiteSmoke; color:black"|
Deposition of TEOS oxide
|-
|-
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Performance
!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Performance
|style="background:LightGrey; color:black"|Film thickness
|style="background:LightGrey; color:black"|Film thickness
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*0 nm - 3000 nm
*Up to 3000 nm
|-
|-
|style="background:LightGrey; color:black"|Step coverage
|style="background:LightGrey; color:black"|Step coverage
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|style="background:LightGrey; color:black"|Gas flows
|style="background:LightGrey; color:black"|Gas flows
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*TEOS (tetraethoxysilane): ~50 sccm. <i>The exact flow is not know - the setpoint is much lower than 50 sccm, but the MFC is not calibrated for TEOS</i>
*TEOS (tetraethoxysilane): ~50 sccm. <i>The exact flow is not know - the setpoint is much lower than 50 sccm, because the MFC is not calibrated for TEOS</i>
*O<sub>2</sub>: 0 sccm
*O<sub>2</sub>: 0 sccm
|-
|-
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