Specific Process Knowledge/Characterization/XRD: Difference between revisions
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We have two X-ray diffraction setups in building 346: | We have two X-ray diffraction setups in building 346: | ||
*The [[/XRD_SmartLab|XRD SmartLab]] primarily for thin film analysis inside the cleanroom. | *The [[/XRD_SmartLab|XRD SmartLab]] primarily for thin film analysis inside the cleanroom. | ||
*The [[/XRD SmartLab 9kW Rotating Anode|XRD SmartLab 9kW Rotating Anode]] multipurpose system outside the cleanroom. | |||
*The [[/XRD_Powder|XRD Powder]] for phase analysis of powders outside the cleanroom. | *The [[/XRD_Powder|XRD Powder]] for phase analysis of powders outside the cleanroom. | ||
==Experiments performed with XRD== | ==Experiments performed with XRD== | ||
*[[/Process Info|List and description of possible XRD measurements with typical setup requirements]] | *[[/Process Info|List and description of possible XRD measurements with typical setup requirements]] Note mostly relevant for XRD Smartlab | ||
==Data analysis== | ==Data analysis== | ||
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==Comparison of the XRDs at Nanolab== | ==Comparison of the XRDs at Nanolab== | ||
{| border=" | {| border="2" cellspacing="0" cellpadding="2" | ||
!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment | !colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment | ||
|style="background:WhiteSmoke; color:black"|<b>XRD SmartLab</b> | |style="background:WhiteSmoke; color:black"|<b>XRD SmartLab</b> | ||
|style="background:WhiteSmoke; color:black"|<b>XRD SmartLab 9kW Rotating Anode</b> | |||
|style="background:WhiteSmoke; color:black"|<b>XRD Powder</b> | |style="background:WhiteSmoke; color:black"|<b>XRD Powder</b> | ||
|- | |- | ||
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and thin film thickness measurement | and thin film thickness measurement | ||
|style="background:WhiteSmoke; color:black"| | |||
*Phase ID | |||
*Crystal Size | |||
*Crystallinity | |||
*Quality and degree of orientation | |||
*3D orientation | |||
*Latice strain | |||
*Composition | |||
*Twist | |||
*3D lattice constant | |||
*Thickness | |||
*Roughness | |||
*Density | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*Phase ID | *Phase ID | ||
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|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
3 kW | 3 kW | ||
|style="background:WhiteSmoke; color:black"| | |||
9 kW | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
600 W | 600 W | ||
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|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"| | ||
Rated tube voltage | Rated tube voltage | ||
|style="background:WhiteSmoke; color:black"| | |||
20 to 45 kV | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
20 to 45 kV | 20 to 45 kV | ||
Line 72: | Line 91: | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
2 to 60 mA | 2 to 60 mA | ||
|style="background:WhiteSmoke; color:black"| | |||
2 to 200 mA | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
15 mA | 15 mA | ||
Line 79: | Line 100: | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
Sealed tube | Sealed tube | ||
|style="background:WhiteSmoke; color:black"| | |||
Rotating Anode | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
Sealed tube | Sealed tube | ||
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|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"| | ||
Target | Target | ||
|style="background:WhiteSmoke; color:black"| | |||
Cu | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
Cu | Cu | ||
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|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
0.4 mm x 8 mm (Line/Point) | 0.4 mm x 8 mm (Line/Point) | ||
|style="background:WhiteSmoke; color:black"| | |||
0.1-0.5 mm x 8 mm (Line/Point) | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
0.4 mm x 12 mm (Line) | 0.4 mm x 12 mm (Line) | ||
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|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"| | ||
Scanning mode | Scanning mode | ||
|style="background:WhiteSmoke; color:black"| | |||
incident / receiver coupled or independent | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
incident / receiver coupled or independent | incident / receiver coupled or independent | ||
Line 106: | Line 135: | ||
|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"| | ||
Goniomenter radius | Goniomenter radius | ||
|style="background:WhiteSmoke; color:black"| | |||
300 mm | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
300 mm | 300 mm | ||
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|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"| | ||
Minimum step size | Minimum step size | ||
|style="background:WhiteSmoke; color:black"| | |||
0.0001° (0.36") | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
0.0001° (0.36") | 0.0001° (0.36") | ||
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|style="background:LightGrey; color:black"| | |style="background:LightGrey; color:black"| | ||
Sample stage motion | Sample stage motion | ||
|style="background:WhiteSmoke; color:black"| | |||
*χ:-5~+95° | |||
*φ:0~360° | |||
*Z:-4~+1 mm | |||
*X,Y:±50 mm for a 100 mm wafer | |||
*Rx,Ry:-5~+5° | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*χ:-5~+95° | *χ:-5~+95° | ||
Line 135: | Line 174: | ||
*Cross Beam Optics(CBO) | *Cross Beam Optics(CBO) | ||
*Ge(220)x2 monochromator | *Ge(220)x2 monochromator | ||
*In-Plane Parallel Slit Collimator (PSC) | |||
*Soller slit | |||
*Automatic variable divergence slit | |||
*Length limiting slits | |||
|style="background:WhiteSmoke; color:black"| | |||
*Cross Beam Optics(CBO) | |||
*Ge(400)x2 monochromator | |||
*In-Plane Parallel Slit Collimator (PSC) | *In-Plane Parallel Slit Collimator (PSC) | ||
*Soller slit | *Soller slit | ||
Line 151: | Line 197: | ||
*Parallel slit analysers (PSA) | *Parallel slit analysers (PSA) | ||
*Ge(220)x2 analyser | *Ge(220)x2 analyser | ||
|style="background:WhiteSmoke; color:black"| | |||
*Automatic variable scattering slit | |||
*Automatic variable receiver slit | |||
*Parallel slit analysers (PSA) | |||
*Ge(400)x2 analyser | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*0.04° soller slit | *0.04° soller slit | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates | ||
|style="background:LightGrey; color:black"|Measurement temperature | |style="background:LightGrey; color:black"|Measurement temperature | ||
|style="background:WhiteSmoke; color:black"| | |||
Room temperature | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
Room temperature | Room temperature | ||
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|- | |- | ||
|style="background:LightGrey; color:black"|Substrate size | |style="background:LightGrey; color:black"|Substrate size | ||
|style="background:WhiteSmoke; color:black"| | |||
up to 150 mm wafers | |||
Thickness max 21 mm | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
up to 150 mm wafers | up to 150 mm wafers | ||
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No powders or dusty materials. | No powders or dusty materials. | ||
|style="background:WhiteSmoke; color:black"| | |||
All materials have to be approved | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
All materials have to be approved | All materials have to be approved |
Latest revision as of 18:09, 25 September 2024
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Unless otherwise stated, this page is written by DTU Nanolab internal
XRD at DTU Nanolab
We have two X-ray diffraction setups in building 346:
- The XRD SmartLab primarily for thin film analysis inside the cleanroom.
- The XRD SmartLab 9kW Rotating Anode multipurpose system outside the cleanroom.
- The XRD Powder for phase analysis of powders outside the cleanroom.
Experiments performed with XRD
- List and description of possible XRD measurements with typical setup requirements Note mostly relevant for XRD Smartlab
Data analysis
For data analysis, we recommend using Rigaku SmartLab Studio for both thinfilms and basic powder analysis. If more advanced powder analysis is needed we provide access to a remote desktop with a licence for the excellent Malvern Panalytical software, HighScore.
- Installing SmartLab Studio II
- Converting data from XRD Powder to SmartLab Studio II
- Guide for using SmartLab Studio II for data analysis
- Guide for using HighScore Plus for advanced powder data analysis
Apart from this commercial software a wide range of free software is available online for data analysis. Here are some suggestions from MIT.
Comparison of the XRDs at Nanolab
Equipment | XRD SmartLab | XRD SmartLab 9kW Rotating Anode | XRD Powder | |
---|---|---|---|---|
Purpose | Crystal structure analysis
and thin film thickness measurement |
|
|
|
X-ray generator |
Maximum rated output |
3 kW |
9 kW |
600 W |
Rated tube voltage |
20 to 45 kV |
20 to 45 kV |
40 kV | |
Rated tube current |
2 to 60 mA |
2 to 200 mA |
15 mA | |
Type |
Sealed tube |
Rotating Anode |
Sealed tube | |
Target |
Cu |
Cu |
Cu | |
Focus size |
0.4 mm x 8 mm (Line/Point) |
0.1-0.5 mm x 8 mm (Line/Point) |
0.4 mm x 12 mm (Line) | |
Goniometer |
Scanning mode |
incident / receiver coupled or independent |
incident / receiver coupled or independent |
incident / receiver coupled |
Goniomenter radius |
300 mm |
300 mm |
145 mm | |
Minimum step size |
0.0001° (0.36") |
0.0001° (0.36") |
0.001° (3.6") | |
Sample stage motion |
|
|
Fixed with rotation | |
Optics | Incident side |
|
|
|
Receiver side |
|
|
| |
Substrates | Measurement temperature |
Room temperature |
Room temperature |
May be heated in N2 up to 500°C |
Substrate size |
up to 150 mm wafers Thickness max 21 mm |
up to 150 mm wafers Thickness max 21 mm |
Only for powders | |
Allowed materials |
All materials approved in the cleanroom. No powders or dusty materials. |
All materials have to be approved |
All materials have to be approved |