Specific Process Knowledge/Etch/Etching of Aluminium: Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/Etching_of_Aluminium click here]''' | |||
<!--Page reviewed by jmli 1/8-2016 --> | <!--Page reviewed by jmli 1/8-2016 --> | ||
<!-- Ok, jmli 2020-0120 --> | <!-- Ok, jmli 2020-0120 --> | ||
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*~60-100nm/min | *~60-100nm/min | ||
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*~ | *~30nm/min (pure Al) | ||
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*~350 nm/min (depending on features size and etch load) | *~350 nm/min (depending on features size and etch load) | ||
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!'''Allowed materials''' | !'''Allowed materials''' | ||
|In 'Aluminium Etch' bath: | |In 'Aluminium Etch' bath: | ||
*See Cross Contamination Sheet for [http://labmanager.dtu.dk/function.php?module=XcMachineaction&view=edit&MachID=381 Aluminium Etch] bath | *See Cross Contamination Sheet for [http://labmanager.dtu.dk/function.php?module=XcMachineaction&view=edit&MachID=381 Aluminium Etch] bath (require login) | ||
In beaker: | In beaker: | ||
*Any material | *Any material | ||