Specific Process Knowledge/Lithography/PMMA: Difference between revisions

Latest revision as of 14:11, 20 January 2020

Feedback to this page: click here

Resist	Polarity	Manufacturer	Comments	Technical reports	Spinner	Thinner	Developer	Rinse	Remover	Process flows (in docx-format)
PMMA	Positive	AllResist	We have various types of PMMA in the cleanroom. Please contact Lithography for information.	MSDS PMMA, Processing guidelines	See table here	Anisole	IPA:H2O (7:3), MIBK:IPA (1:3)	IPA	acetone/1165

Spin Curves

The thickness is measured on VASE Ellipsometer using a simple Cauchy model for a transparent polymer on Si. The measurements are performed at one incidence angle (70 degrees) only. 9 points on each 4" wafer has been measured; the standard deviation thus representing the homogeinity of the film on the 4" wafers. Please notice, that the spinning curves were made in 2015.

AllResist AR-P 672.03 (PMMA) (~ 2ml per 4" wafer) spin coated on 'Spin Coater: Manual Standard Resists, E-5, WILTID & TIGRE, 26-10-2015. Softbake 3 min @ 150 degC.
Spin Speed [rpm]	Acceleration [rpm/s]	Thickness [nm]	St Dev
4000	2000	95.55	0.55
5000	2000	85.50	0.92
7000	2000	72.79	1.18

AllResist AR-P 672.03 (PMMA) diluted 1:1 in Anisole (~ 2ml per 4" wafer) spin coated on 'Spin Coater: Manual Standard Resists, E-5, WILTID & TIGRE, 26-10-2015. Softbake 3 min @ 150 degC.
Spin Speed [rpm]	Acceleration [rpm/s]	Thickness [nm]	St Dev
2000	2000	51.37	0.25
3000	2000	41.97	0.24
4000	2000	36.25	0.25
5000	2000	32.42	0.30
6000	2000	30.17	0.29
7000	2000	28.76	0.43

@@ Line 1: / Line 1: @@
+'''Feedback to this page''': '''[mailto:lithography@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/PMMA click here]'''
 {|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" width="95%"
@@ Line 26: / Line 28: @@
 | [http://www.allresist.com AllResist]
 |We have various types of PMMA in the cleanroom. Please contact [mailto:Lithography@danchip.dtu.dk Lithography] for information.
-| [[media:MSDS PMMA.pdf|MSDS PMMA]] [[media:AR-P631_679.pdf|Processing guidelines]]
+| [[media:MSDS PMMA.pdf|MSDS PMMA]],  [[media:AR-P631_679.pdf|Processing guidelines]]
 |See table <u>[[Specific_Process_Knowledge/Lithography/Coaters#Coaters:_Comparison_Table|here]] </u>
 |Anisole
-|MIBK:IPA (1:3), IPA:H2O
+|IPA:H2O (7:3), MIBK:IPA (1:3)
 |IPA
 |acetone/1165
@@ Line 42: / Line 44: @@
-The thickness is measured on VASE Ellipsometer using a simple Cauchy model for a transparent polymer on Si. The measurements are performed at one incidence angle (70 degrees) only. 9 points on each 4" wafer has been measured; the standard deviation thus representing the homogeinity of the film on the 4" wafers.
+The thickness is measured on VASE Ellipsometer using a simple Cauchy model for a transparent polymer on Si. The measurements are performed at one incidence angle (70 degrees) only. 9 points on each 4" wafer has been measured; the standard deviation thus representing the homogeinity of the film on the 4" wafers. Please notice, that the spinning curves were made in 2015.
@@ Line 59: / Line 61: @@
 |-style="background:silver; color:black"
 !Spin Speed [rpm]
-!Acceleration [1/s2]
+!Acceleration [rpm/s]
 !Thickness [nm]
 !St Dev
@@ Line 102: / Line 104: @@
 |-style="background:silver; color:black" style="text-align:left;"
 !Spin Speed [rpm]
-!Acceleration [1/s2]
+!Acceleration [rpm/s]
 !Thickness [nm]
 !St Dev