Specific Process Knowledge/Lithography/PMMA: Difference between revisions
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'''Feedback to this page''': '''[mailto:lithography@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/PMMA click here]''' | |||
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|'''Spinner''' | |'''Spinner''' | ||
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|'''Developer''' | |'''Developer''' | ||
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|'''[[Specific_Process_Knowledge/Lithography/ | |'''[[Specific_Process_Knowledge/Lithography/PMMA|PMMA]]''' | ||
|Positive | |Positive | ||
|[http://www.allresist.com AllResist] | | [http://www.allresist.com AllResist] | ||
| | |We have various types of PMMA in the cleanroom. Please contact [mailto:Lithography@danchip.dtu.dk Lithography] for information. | ||
|[[media: | | [[media:MSDS PMMA.pdf|MSDS PMMA]], [[media:AR-P631_679.pdf|Processing guidelines]] | ||
|[[Specific_Process_Knowledge/Lithography/Coaters# | |See table <u>[[Specific_Process_Knowledge/Lithography/Coaters#Coaters:_Comparison_Table|here]] </u> | ||
| | |Anisole | ||
|IPA:H2O (7:3), MIBK:IPA (1:3) | |||
|IPA | |IPA | ||
| | |acetone/1165 | ||
| | | | ||
|} | |} | ||
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== Spin Curves == | == Spin Curves == | ||
The thickness is measured on VASE Ellipsometer using a simple Cauchy model for a transparent polymer on Si. The measurements are performed at one incidence angle (70 degrees) only. 9 points on each 4" wafer has been measured; the standard deviation thus representing the homogeinity of the film on the 4" wafers. | The thickness is measured on VASE Ellipsometer using a simple Cauchy model for a transparent polymer on Si. The measurements are performed at one incidence angle (70 degrees) only. 9 points on each 4" wafer has been measured; the standard deviation thus representing the homogeinity of the film on the 4" wafers. Please notice, that the spinning curves were made in 2015. | ||
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!Spin Speed [rpm] | !Spin Speed [rpm] | ||
!Acceleration [ | !Acceleration [rpm/s] | ||
!Thickness [nm] | !Thickness [nm] | ||
!St Dev | !St Dev | ||
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!Spin Speed [rpm] | !Spin Speed [rpm] | ||
!Acceleration [ | !Acceleration [rpm/s] | ||
!Thickness [nm] | !Thickness [nm] | ||
!St Dev | !St Dev | ||
Latest revision as of 14:11, 20 January 2020
Feedback to this page: click here
| Resist | Polarity | Manufacturer | Comments | Technical reports | Spinner | Thinner | Developer | Rinse | Remover | Process flows (in docx-format) |
| PMMA | Positive | AllResist | We have various types of PMMA in the cleanroom. Please contact Lithography for information. | MSDS PMMA, Processing guidelines | See table here | Anisole | IPA:H2O (7:3), MIBK:IPA (1:3) | IPA | acetone/1165 |
Spin Curves
The thickness is measured on VASE Ellipsometer using a simple Cauchy model for a transparent polymer on Si. The measurements are performed at one incidence angle (70 degrees) only. 9 points on each 4" wafer has been measured; the standard deviation thus representing the homogeinity of the film on the 4" wafers. Please notice, that the spinning curves were made in 2015.
| AllResist AR-P 672.03 (PMMA) (~ 2ml per 4" wafer) spin coated on 'Spin Coater: Manual Standard Resists, E-5, WILTID & TIGRE, 26-10-2015. Softbake 3 min @ 150 degC. | ||||||
|---|---|---|---|---|---|---|
| Spin Speed [rpm] | Acceleration [rpm/s] | Thickness [nm] | St Dev | |||
| 4000 | 2000 | 95.55 | 0.55 | |||
| 5000 | 2000 | 85.50 | 0.92 | |||
| 7000 | 2000 | 72.79 | 1.18 | |||
| AllResist AR-P 672.03 (PMMA) diluted 1:1 in Anisole (~ 2ml per 4" wafer) spin coated on 'Spin Coater: Manual Standard Resists, E-5, WILTID & TIGRE, 26-10-2015. Softbake 3 min @ 150 degC. | ||||||
|---|---|---|---|---|---|---|
| Spin Speed [rpm] | Acceleration [rpm/s] | Thickness [nm] | St Dev | |||
| 2000 | 2000 | 51.37 | 0.25 | |||
| 3000 | 2000 | 41.97 | 0.24 | |||
| 4000 | 2000 | 36.25 | 0.25 | |||
| 5000 | 2000 | 32.42 | 0.30 | |||
| 6000 | 2000 | 30.17 | 0.29 | |||
| 7000 | 2000 | 28.76 | 0.43 | |||