Specific Process Knowledge/Characterization/Optical microscope: Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@ | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/Optical_microscope click here]''' | ||
''This page is written by DTU Nanolab internal'' | |||
[[Category: Equipment|Characterization Optical mi]] | [[Category: Equipment|Characterization Optical mi]] | ||
[[Category: Characterization|Optical mi]] | [[Category: Characterization|Optical mi]] | ||
{|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" | |||
|- | |||
|-style="background:white; color:black; vertical-align:middle; text-align:center;" | |||
| | |||
!Nikon SMZ 1000 | |||
!Noco IR | |||
!Leica INM 100 | |||
!Zeiss Jenatech | |||
!Nikon Eclipse L200 #1 | |||
!Nikon Eclipse L200 #2 | |||
!Nikon Eclipse L200N #3 | |||
!Nikon Eclipse L200N #4 | |||
!Nikon ME 600 | |||
!Leica S8 APO | |||
!Zeiss Axiotron | |||
|- | |||
|- | |||
|-style="background:white; color:black; vertical-align:middle; text-align:center;" | |||
| | |||
|[[image:Nikon SMZ 1000.jpg|100x100px|thumb|center]] | |||
|[[image:Noco IR microscope.jpg|100x100px|thumb|center]][[image:Noco IR microscope_1.jpg|100x100px|thumb|center]] | |||
|[[image:LeicaINM100.jpg|100x100px|thumb|center]] | |||
|[[image:Zeiss Jenatech strain.jpg|100x100px|thumb|center]][[image:Zeiss Jenatech strain_1.jpg|100x100px|thumb|center]] | |||
|[[image:Nikon Eclipse L200.jpg|100x100px|thumb|center]][[image:Nikon Eclipse L200_1.jpg|100x100px|thumb|center]] | |||
|[[image:Nikon Eclipse L200 2.jpg|100x100px|thumb|center]][[image:Nikon Eclipse L200 2_1.jpg|100x100px|thumb|center]] | |||
|[[image:Nikon Eclipse L 200 3_1.jpg|100x100px|thumb|center]] | |||
|[[image:Nikon Eclipse L 200 4_1.jpg|100x100px|thumb|center]] | |||
|[[image:Nikon ME 600.jpg|100x100px|thumb|center]][[image:Nikon ME 600_1.jpg|100x100px|thumb|center]] | |||
|[[image:Leica S8 APO.jpg|100x100px|thumb|center]] | |||
|[[image:Zeiss Axiotron.jpg|100x100px|thumb|center]][[image:Zeiss Axiotron_1.jpg|100x100px|thumb|center]] | |||
|- | |||
|- | |||
|-style="background:LightGrey; color:black; vertical-align:middle; text-align:left;" | |||
!Location | |||
|346-901 | |||
|346-901 | |||
|346-901 | |||
|cleanroom A1 | |||
|cleanroom D3 | |||
|cleanroom F3 | |||
|cleanroom E4 | |||
|cleanroom E5 | |||
|cleanroom F1 | |||
|cleanroom Cx1 | |||
|cleanroom D3 | |||
|- | |||
|- | |- | ||
|-style="background:WhiteSmoke; color:black; vertical-align:middle; text-align:left;" | |||
!Responsible group | |||
|Wet chemistry | |||
|Wet chemistry | |||
|Wet chemistry | |||
|Lithography | |||
|Lithography | |||
|Lithography | |||
|Lithography | |||
|Lithography | |||
|Lithography | |||
|Lithography | |||
|Lithography | |||
|- | |||
|- | |||
|-style="background:LightGrey; color:black; vertical-align:middle; text-align:left;" | |||
!Objectives | |||
|Zoom 0.8x - 8x | |||
| | |||
*2.5x | |||
*10x | |||
*20x | |||
*50x | |||
| | |||
*2.5x | |||
*5x | |||
*10x | |||
*20x | |||
*50x | |||
| | |||
*5x | |||
*10x | |||
*20x | |||
*50x | |||
*100x | |||
| | |||
*2.5x | |||
*5x | |||
*10x | |||
*20x | |||
*50x | |||
| | |||
*2.5x | |||
*5x | |||
*10x | |||
*20x | |||
*50x | |||
*100x | |||
| | | | ||
*2.5x | |||
*5x | |||
*10x | |||
*20x | |||
*50x | |||
*100x | |||
| | |||
*2.5x | |||
*5x | |||
*10x | |||
*20x | |||
*50x | |||
*100x | |||
| | |||
*5x | |||
*10x | |||
*20x | |||
*50x | |||
*100x | |||
|Zoom 1x - 8x | |||
| | | | ||
| | *5x | ||
*10x | |||
*20x | |||
*50x | |||
|- | |||
| | |||
|- | |- | ||
| | |-style="background:WhiteSmoke; color:black; vertical-align:middle; text-align:left;" | ||
!Ocular | |||
|10x | |||
|10x | |||
|10x | |||
|10x | |10x | ||
|10x | |10x | ||
|10x | |10x | ||
|10x | |10x | ||
|10x | |10x | ||
|10x | |10x | ||
|10x | |10x | ||
|10x | |10x | ||
|- | |- | ||
| | |||
| | |- | ||
| | |-style="background:LightGrey; color:black; vertical-align:middle; text-align:left;" | ||
| | !Special features | ||
| | |Stereoscopic microscope | ||
| | |IR imaging | ||
| | | | ||
| | | | ||
| | | | ||
| | *Motorized stage | ||
| | *'''[[Specific_Process_Knowledge/Characterization/Optical microscope/Nikon Eclipse L200 auto scan guide|Auto scan guide]]''' | ||
| | | | ||
| | |||
| | |||
| | |||
|Stereoscopic microscope | |||
| | |||
|- | |- | ||
|- | |- | ||
| | |-style="background:WhiteSmoke; color:black; vertical-align:middle; text-align:left;" | ||
| | !Contrast mechanisms | ||
| | | | ||
| | *Brightfield | ||
| | | | ||
| | *Polarizer | ||
| | *Brightfield | ||
| | | | ||
| | *Brightfield | ||
| | *Darkfield | ||
| | | | ||
| | *Polarizer | ||
*Brightfield | |||
| | |||
*Brightfield | |||
*Darkfield | |||
| | |||
*Brightfield | |||
*Darkfield | |||
| | |||
*Polarizer | |||
*Brightfield | |||
*Darkfield | |||
| | |||
*Polarizer | |||
*Brightfield | |||
*Darkfield | |||
| | |||
*Polarizer | |||
*Brightfield | |||
*Darkfield | |||
| | |||
*Brightfield | |||
| | |||
*Brightfield | |||
*Darkfield | |||
|- | |- | ||
|- | |- | ||
| | |-style="background:LightGrey; color:black; vertical-align:middle; text-align:left;" | ||
| | !Illumination modes | ||
| | | | ||
| | *Episcopic | ||
| | | | ||
| | *Episcopic | ||
| | *Diascopic | ||
| | | | ||
| | *Episcopic | ||
| | *Diascopic | ||
| | | | ||
*Episcopic | |||
*Diascopic | |||
| | |||
*Episcopic | |||
*Diascopic | |||
| | |||
*Episcopic | |||
*Diascopic | |||
| | |||
*Episcopic | |||
*Diascopic | |||
| | |||
*Episcopic | |||
*Diascopic | |||
| | |||
*Episcopic | |||
| | |||
*Episcopic | |||
| | |||
*Episcopic | |||
*Diascopic | |||
|- | |- | ||
|- | |- | ||
| | |-style="background:WhiteSmoke; color:black; vertical-align:middle; text-align:left;" | ||
| | !Camera | ||
| | |None | ||
| | |IR camera | ||
| | |DS-Fi2 | ||
| | |None | ||
| | |DS-Fi1 | ||
| | |DS-Fi1 | ||
| | | | ||
| | *DS-Fi2 | ||
| | *C-mount, 0.7x relay | ||
| | | | ||
*DS-Fi2 | |||
*C-mount, 0.7x relay | |||
|DS-Fi2 | |||
|None | |||
|Infinity X | |||
|- | |- | ||
|- | |- | ||
| | |-style="background:LightGrey; color:black; vertical-align:middle; text-align:left;" | ||
| | !Analysis software | ||
| | |None | ||
| | |None | ||
| | |NIS-D | ||
| | |None | ||
| | |NIS-BR | ||
| | |NIS-D | ||
| | |NIS-D | ||
| | |NIS-D | ||
| | |NIS-D | ||
| | |None | ||
|DeltaPix | |||
|- | |- | ||
|} | |} | ||
<br clear="all" /> | |||
There are also two optical microscopes in building 451, a stereo microscope and a transmission microscope, that were both previously located in Packlab. Please ask staff / the BioMic group for details. |
Latest revision as of 11:35, 7 November 2023
Feedback to this page: click here
This page is written by DTU Nanolab internal
Nikon SMZ 1000 | Noco IR | Leica INM 100 | Zeiss Jenatech | Nikon Eclipse L200 #1 | Nikon Eclipse L200 #2 | Nikon Eclipse L200N #3 | Nikon Eclipse L200N #4 | Nikon ME 600 | Leica S8 APO | Zeiss Axiotron | |
---|---|---|---|---|---|---|---|---|---|---|---|
Location | 346-901 | 346-901 | 346-901 | cleanroom A1 | cleanroom D3 | cleanroom F3 | cleanroom E4 | cleanroom E5 | cleanroom F1 | cleanroom Cx1 | cleanroom D3 |
Responsible group | Wet chemistry | Wet chemistry | Wet chemistry | Lithography | Lithography | Lithography | Lithography | Lithography | Lithography | Lithography | Lithography |
Objectives | Zoom 0.8x - 8x |
|
|
|
|
|
|
|
|
Zoom 1x - 8x |
|
Ocular | 10x | 10x | 10x | 10x | 10x | 10x | 10x | 10x | 10x | 10x | 10x |
Special features | Stereoscopic microscope | IR imaging |
|
Stereoscopic microscope | |||||||
Contrast mechanisms |
|
|
|
|
|
|
|
|
|
|
|
Illumination modes |
|
|
|
|
|
|
|
|
|
|
|
Camera | None | IR camera | DS-Fi2 | None | DS-Fi1 | DS-Fi1 |
|
|
DS-Fi2 | None | Infinity X |
Analysis software | None | None | NIS-D | None | NIS-BR | NIS-D | NIS-D | NIS-D | NIS-D | None | DeltaPix |
There are also two optical microscopes in building 451, a stereo microscope and a transmission microscope, that were both previously located in Packlab. Please ask staff / the BioMic group for details.