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Specific Process Knowledge/Etch/Etching of Platinum: Difference between revisions

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'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/Etching_of_Platin click here]'''
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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/Etching_of_Platin click here]'''


[[Category: Equipment|Etch Wet Platinum]]
[[Category: Equipment|Etch Wet Platinum]]
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!Etch rate range
!Etch rate range
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*~?nm/min
*~ 1 - 10 nm/min (not tested yet)
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*~30nm/min (not tested yet)  
*~30nm/min (not tested yet)  
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