Specific Process Knowledge/Characterization/XPS: Difference between revisions

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Unless otherwise stated, all content on this page was created by Jonas Michael-Lindhard, DTU Nanolab

The XPS tools at DTU Nanolab

The K-Alpha from 2007 is one of the first instruments of this type that was produced.Photo: DTU Nanolab internal

The Nexsa from 2019 is on the surface very similar to the K-Alpha. Its panels, however, hide a whole range of supplementary techniques.Photo: DTU Nanolab internal

In the basement under the cleanroom two X-ray Photoelectron Spectroscopy (XPS) systems are installed back-to-back in the center of room 904. They are both manufactured by Thermofisher and they enable the users to perform elemental and chemical analysis of samples. The XPS K-Alpha is a base technique instrument providing XPS analysis. The XPS Nexsa is an upgraded version with all options.

Elemental analysis

The XPS instrument enables elemental analysis, chemical state analysis on the sample surface or deeper down by a depth profiling. A comparison about techniques and instruments used for elemental analysis at DTU Nanolab can be found on the page Element analysis.

More about the different possibilities of the XPS instrument is found here:

Getting access to the XPS tools

Click HERE to see information on how to get access to the XPS.

Analyzing XPS spectra

The analysis of XPS spectra is an art in itself. It can be done using various software packages available on the internet. In the links below we will focus on two such examples, Avantage and CasaXPS.

Techniques and option on the XPS tools

Equipment		XPS K-Alpha (Manufactured by Thermofisher)	XPS Nexsa (Manufactured by Thermofisher)
Purpose	Main	XPS analysis using monochromated Al-Kα radiation at 1486.6 eV	XPS analysis using monochromated Al-Kα radiation at 1486.6 eV
Purpose	Alternative/complementary	Work function measurements	Work function measurements Ultraviolet Photoelectron Spectroscopy (UPS) with He I and He II UV source Ion Scattering Spectroscopy or ISS Reflected Electron Energy Loss Spectroscopy or REELS Angular Resolved Ultraviolet Photoelectron Spectroscopy (ARUPS) Raman spectroscopy
Performance	Spot size	XPS: 30µm - 400µm	XPS: 10µm - 400µm Raman: > 15 µm
	Pass energy	10-400 eV	10-400 eV (XPS and ISS)
	Analysis modes	Scanned and snapshot	Scanned, snapshot and SnapMap
	Charge compensation	Flood gun to be used for charge compensation of non conductive samples only	Flood gun to be used for charge compensation of non conductive samples and for source of low energy electrons (REELS)
	Depth profiles	Depth profiles with single Ar ion bombardment Monoatomic energy range 200-3000 eV	Depth profiles with MonoAtomic and Gas Cluster Ion Source (MAGCIS) Monoatomic energy range 200-4000 eV Cluster mode energy range: 2-8 keV Cluster size range: 75-2000 atoms
Substrates / Samples	Sample holder size	Maximum 60x60 mm	Maximum 60x60 mm
Substrates / Samples	Sample height	Maximum 20 mm	Maximum 20 mm

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+'''Unless anything else is stated, everything on this page, text and pictures are made by DTU Nanolab.'''
-'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Characterization/XPS click here]'''
+'''All links to Kemibrug (SDS) and Labmanager Including APV and QC requires login.'''
+'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Characterization/XPS click here]'''
+<!--Checked for updates on 14/5-2018 - ok/jmli -->
+{{Template:Author-jmli1}}
-==XPS-ThermoScientific==
+==The XPS tools at DTU Nanolab==
-[[image:XPS instrument2.JPG|300x300px|right|thumb|The XPS system placed at Danchip (room 904, building 346).]]
-A X-ray Photoelectron Spectroscopy (XPS) system can be used at Danchip. The system is a Thermo K-Alpha system, placed in the basement of building 346.
+[[Image:XPS K-Alpha.jpg |frame|x300px|The K-Alpha from 2007 is one of the first instruments of this type that was produced.{{photo1}} ]]
+[[Image:XPS Nexsa.png |frame|x300px|The Nexsa from 2019 is on the surface very similar to the K-Alpha. Its panels, however, hide a whole range of supplementary techniques.{{photo1}} ]]
+In the basement under the cleanroom two X-ray Photoelectron Spectroscopy (XPS) systems are installed back-to-back in the center of room 904. They are both manufactured by Thermofisher and they enable the users to perform elemental and chemical analysis of samples. The [[Specific Process Knowledge/Characterization/XPS/K-Alpha |XPS K-Alpha]] is a base technique instrument providing XPS analysis. The [[Specific Process Knowledge/Characterization/XPS/Nexsa |XPS Nexsa]] is an upgraded version with all options.
+* [[Specific Process Knowledge/Characterization/XPS/K-Alpha|The XPS K-Alpha page]]
+* [[Specific Process Knowledge/Characterization/XPS/Nexsa|The XPS Nexsa page]]
-'''The user manual(s), user APV(s), technical information and contact information can be found in LabManager:'''
+==Elemental analysis==
-<!-- remember to remove the type of documents that are not present -->
+The XPS instrument enables elemental analysis, chemical state analysis on the sample surface or deeper down by a depth profiling. A comparison about techniques and instruments used for elemental analysis at DTU Nanolab can be found on the page [[Specific Process Knowledge/Characterization/Element analysis|Element analysis]].
+More about the different possibilities of the XPS instrument is found here:
+*[[Specific Process Knowledge/Characterization/XPS/XPS technique|The XPS technique]]
+*[[Specific Process Knowledge/Characterization/XPS/XPS elemental composition|Elemental analysis]]
+*[[Specific Process Knowledge/Characterization/XPS/XPS Depth profiling|Depth profiling]]
+*[[Specific Process Knowledge/Characterization/XPS/Carbon contamination|Carbon contamination]]
-<!-- give the link to the equipment info page in LabManager: -->
+*[[Specific Process Knowledge/Characterization/XPS/ExtDocs | Links to external material ]]
-[http://http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=276  XPS-ThermoScientific in LabManager]
+*[[Specific Process Knowledge/Characterization/XPS/Training | Links to instruction videos ]]
-==Elemental analysis==
+== Getting access to the XPS tools==
-The XPS instrument can be used to do elemental analysis, chemical state analysis on the sample surface or deeper down by a depth profiling. A comparison about techniques and instruments used for elemental analysis at Danchip can be found on the page [[Specific Process Knowledge/Characterization/Element analysis|Element analysis]].
+Click [[Specific Process Knowledge/Characterization/XPS/Access | '''HERE''' ]] to see information on how to get access to the XPS.
+== Analyzing XPS spectra ==
+The analysis of XPS spectra is an art in itself. It can be done using various software packages available on the internet. In the links below we will focus on two such examples, Avantage and CasaXPS.
-More about the different possibilities of the XPS instrument is found here:
+*[[Specific Process Knowledge/Characterization/XPS/SoftwareInstall|How to access XPS software: Download/install or by access to server]]
-*[[Specific Process Knowledge/Characterization/XPS/XPS technique|XPS technique]]
+*[[Specific Process Knowledge/Characterization/XPS/Processing|Processing XPS data with Avantage]]
-*[[Specific Process Knowledge/Characterization/XPS/XPS elemental composition|Elemental composition analysis]]
+*[[Specific Process Knowledge/Characterization/XPS/Export2CasaXPS | Export Avantage data to CasaXPS]]
-*[[Specific Process Knowledge/Characterization/XPS/XPS Chemical states |Chemical state analysis]]
-*[[Specific Process Knowledge/Characterization/XPS/XPS Depth profiling|Depth profiling]]
-==Equipment performance of XPS-ThermoScientific==
+==Techniques and option on the XPS tools==
-{| border="2" cellspacing="0" cellpadding="20" |-
+{| border="2" cellspacing="0" cellpadding="1"
-!style="background:silver; color:black;" align="left"|Purpose
+|-
-|style="background:LightGrey; color:black"|Chemical analysis
+!style="background:silver; color:black;" align="left" colspan="2"|Equipment
+!style="background:silver; color:black;" align="left" |[[Specific Process Knowledge/Characterization/XPS/K-Alpha |XPS K-Alpha (Manufactured by Thermofisher)]]
+!style="background:silver; color:black;" align="left" |[[Specific Process Knowledge/Characterization/XPS/Nexsa |XPS Nexsa (Manufactured by Thermofisher)]]
+|-
+!style="background:silver; color:black;" align="left" rowspan="2"|Purpose
+|style="background:LightGrey; color:black"|Main
+|style="background:WhiteSmoke; color:black"| XPS analysis using monochromated Al-Kα radiation at 1486.6 eV
+|style="background:WhiteSmoke; color:black"| XPS analysis using monochromated Al-Kα radiation at 1486.6 eV
+|-
+|style="background:LightGrey; color:black"|Alternative/complementary
 |style="background:WhiteSmoke; color:black"|
-* [[Specific Process Knowledge/Characterization/XPS/XPS elemental composition|Probing elemental composition]]
+* Work function measurements
-* [[Specific Process Knowledge/Characterization/XPS/XPS Chemical states |Chemical state identification]]
+|style="background:WhiteSmoke; color:black"|
-* Non destructive technique
+* Work function measurements
-* Surface sensitive
+* [[Specific Process Knowledge/Characterization/XPS/UPS technique| Ultraviolet Photoelectron Spectroscopy (UPS) with He I and He II UV source]]
-* [[Specific Process Knowledge/Characterization/XPS/XPS Depth profiling|Depth profiling]] possible by ion beam etch of sample
+* [[Specific Process Knowledge/Characterization/XPS/ISS|Ion Scattering Spectroscopy or ISS]]
+* [[Specific Process Knowledge/Characterization/XPS/REELS|Reflected Electron Energy Loss Spectroscopy or REELS]]
+* Angular Resolved Ultraviolet Photoelectron Spectroscopy (ARUPS)
+* [[Specific Process Knowledge/Characterization/XPS/Raman|Raman spectroscopy]]
 |-
 !rowspan="5" style="background:silver; color:black" align="left"| Performance
 |style="background:LightGrey; color:black"|Spot size
-|style="background:WhiteSmoke; color:black"|Can be set between 30µm - 400µm
+|style="background:WhiteSmoke; color:black"|XPS: 30µm - 400µm
+|style="background:WhiteSmoke; color:black"|
+* XPS: 10µm - 400µm
+* Raman: > 15 µm
 |-
-|style="background:LightGrey; color:black"|Probing depth
+|style="background:LightGrey; color:black"|Pass energy
-|style="background:WhiteSmoke; color:black"|Depending on probed element. Max probe depth lies within 10-200 Å.
+|style="background:WhiteSmoke; color:black"|10-400 eV
+|style="background:WhiteSmoke; color:black"|10-400 eV (XPS and ISS)
 |-
-|style="background:LightGrey; color:black"|Resolution
+|style="background:LightGrey; color:black"|Analysis modes
-|style="background:WhiteSmoke; color:black"|Dependent on probed elements. Concentrations down to about 0,5 atomic % can in some cases be detected.
+|style="background:WhiteSmoke; color:black"|Scanned and snapshot
+|style="background:WhiteSmoke; color:black"|Scanned, snapshot and SnapMap
 |-
 |style="background:LightGrey; color:black"|Charge compensation
-|style="background:WhiteSmoke; color:black"|
+|style="background:WhiteSmoke; color:black"| Flood gun to be used for charge compensation of non conductive samples only
-Flood gun can be used for charge compensation of non conductive samples
+|style="background:WhiteSmoke; color:black"| Flood gun to be used for charge compensation of non conductive samples and for source of low energy electrons (REELS)
-|-
-|style="background:LightGrey; color:black"|Finding structures
-|style="background:WhiteSmoke; color:black"|Choose measuring spot from camera image (magnified)
-|-
-|-
 |-
-!rowspan="2" style="background:silver; color:black" align="left"|Depth profiling
+|style="background:LightGrey; color:black"|Depth profiles
-|style="background:LightGrey; color:black"|Purpose
+|style="background:WhiteSmoke; color:black"|Depth profiles with single Ar ion bombardment
-|style="background:WhiteSmoke; color:black"|With ion beam etch the top layer of the material can be removed, to do a depth profiling
+* Monoatomic energy range 200-3000 eV
+|style="background:WhiteSmoke; color:black"|Depth profiles with MonoAtomic and Gas Cluster Ion Source ([[Media:MAGCIS.pdf |MAGCIS]])
+* Monoatomic energy range 200-4000 eV
+* Cluster mode energy range: 2-8 keV
+*Cluster size range: 75-2000 atoms
 |-
-|style="background:LightGrey; color:black"|Ion beam size
+!rowspan="2" style="background:silver; color:black" align="left"|Substrates / Samples
-|style="background:WhiteSmoke; color:black"| About 3x1 mm
+|style="background:LightGrey; color:black"|Sample holder size
+|style="background:WhiteSmoke; color:black"| Maximum 60x60 mm
+|style="background:WhiteSmoke; color:black"| Maximum 60x60 mm
 |-
-!rowspan="2" style="background:silver; color:black" align="left"|Substrates
+| style="background:LightGrey; color:black"|Sample height
-|style="background:LightGrey; color:black"|Substrate size
+|style="background:WhiteSmoke; color:black"| Maximum 20 mm
-|style="background:WhiteSmoke; color:black"|
+|style="background:WhiteSmoke; color:black"| Maximum 20 mm
-Maximum 60x60 mm
-|-
-| style="background:LightGrey; color:black"|Substrate thickness
-|style="background:WhiteSmoke; color:black"|
-Maximum height about 20 mm
 |-
 |}