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{{cc-nanolab}}


[[Category: Equipment|Lithography exposure]]
[[Category: Lithography|Exposure]]
__TOC__
=UV Exposure Comparison Table=
{| class="wikitable"
|-
!
! [[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MA6-1|Aligner: MA6-1]]
! [[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MA6-2|Aligner: MA6-2]]
! [[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MLA1|Aligner: Maskless 01]]
! [[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MLA2|Aligner: Maskless 02]]
! [[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MLA3|Aligner: Maskless 03]]
! [[Specific_Process_Knowledge/Lithography/UVExposure/aligner_MLA4|Aligner: Maskless 04]]
|-
! scope=row| Purpose
|
*Top side alignment
*Back side alignment
*UV exposure
NB: this tool is in PolyFabLab
|
*Top side alignment
*Back side alignment
*UV exposure
*Bond alignment
|
*Top side alignment
*Maskless UV exposure
|
*Top side alignment
*Back side alignment
*Maskless UV exposure
|
*Top side alignment
*Back side alignment
*Maskless UV exposure
|
*Top side alignment
*Maskless UV exposure
*Direct laser writing
NB: this tool is in PolyFabLab
|-
! scope=row| Minimum feature size
| ~1 µm || ~1 µm || ~1 µm || ~1 µm || ~1 µm || ~1 µm
|-
! scope=row| Alignment accuracy
|
*TSA: ±2 µm
*BSA: ±5 µm
|
*TSA: ±1 µm
*BSA: ±2 µm
|
±2 µm<br>(±1 µm possible)
|
*TSA: ± 0.5 µm
*BSA: ± 1 µm
|
*TSA: ± 0.5 µm
*BSA: ± 1 µm
|
±1 µm
|-
! scope=row| Exposure light source
|
*350 W Hg lamp
*i-line filter (365nm band pass filter)
|
*500 W Hg-Xe lamp
*i-line filter (365nm band pass filter)
|
365 nm LED
|
375 nm laser diode array
|
405 nm laser diode array
|
*365 nm LED
*405 nm laser diode
|-
! scope=row| Exposure mode
|
*Flood exposure
*Proximity
*Contact:
**Soft contact
**Hard contact
**Vacuum contact
|
*Flood exposure
*Proximity
*Contact:
**Soft contact
**Hard contact
**Vacuum contact
|
*Projection:
**Pneumatic auto-focus
|
*Projection:
**Optical auto-focus
**Pneumatic auto-focus
|
*Projection:
**Pneumatic auto-focus
|
*Projection:
**Optical auto-focus
**Pneumatic auto-focus
*Direct laser writing:
**Optical auto-focus
**Pneumatic auto-focus
|-
! scope=row| Batch size
| 1 || 1 || 1 || 1 || 1 || 1
|-
! scope=row| Allowed materials
| All PolyFabLab materials
|
*All cleanroom materials except copper and steel
*Dedicated chuck for III-V materials
| All cleanroom materials
| All cleanroom materials
| All cleanroom materials
| All PolyFabLab materials
|-
|}
=Mask vs Maskless aligners=
Comparison study between mask aligners and maskless aligners can be found [[Specific_Process_Knowledge/Lithography/Aligners/MAvsMLA|here]].
=Decommisioned tools=
<span style="color:red">Inclined UV lamp was decommissioned 2023.</span>
[[Specific Process Knowledge/Lithography/UVExposure/aligner_inclinedUV|Information about decommissioned tool can be found here.]]
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/UVExposure"