Specific Process Knowledge/Lithography/Development/manualTMAH developer: Difference between revisions
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=Developer: TMAH Manual 02= | =Developer: TMAH Manual 02= | ||
[[file:Developer_TMAH_manual_02.jpg|400px|right|thumb|Developer: TMAH Manual 02 is located in E-4.]] | [[file:Developer_TMAH_manual_02.jpg|400px|right|thumb|Developer: TMAH Manual 02 is located in E-4.]] | ||
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Single substrates are loaded manually into the tool, but the developer dispense, puddle time, agitation, rinse and drying is controlled by the tool. | Single substrates are loaded manually into the tool, but the developer dispense, puddle time, agitation, rinse and drying is controlled by the tool. | ||
{| class="wikitable" | {| class="wikitable" | ||
! style="text-align:left" | Product | ! style="text-align:left" | Product | ||
| style="padding-left: 10px" | Laurell EDC-650-HZB-23NP | | style="padding-left: 10px" | Laurell EDC-650-HZB-23NP | ||
|- | |- | ||
! style="text-align:left" | Year of purchase | ! style="text-align:left" | Year of purchase | ||
| style="padding-left: 10px" | 2016 | | style="padding-left: 10px" | 2016 | ||
|- | |- | ||
! style="text-align:left" | Tool modification | ! style="text-align:left" | Tool modification | ||
| style="padding-left: 10px" | | | style="padding-left: 10px" | | ||
Converted from e-beam solvent developer to UV TMAH developer in 2024<br> | |||
Added media flow controllers for developer, rinse and drying media in 2025 | |||
|- | |- | ||
! style="text-align:left" | Location | ! style="text-align:left" | Location | ||
| style="padding-left: 10px" | Cleanroom E-4 | | style="padding-left: 10px" | Cleanroom E-4 | ||
|} | |} | ||
'''User manual'''<br> | '''User manual'''<br> | ||
The user manual and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach= | The user manual and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=341 LabManager] - '''requires login''' | ||
'''Tool training'''<br> | '''Tool training'''<br> | ||
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! scope=row style="text-align: left;" | Substrate batch size | ! scope=row style="text-align: left;" | Substrate batch size | ||
| 1 | | 1 | ||
|- | |||
! scope=row style="text-align: left;" | Media flow rates | |||
| | |||
*AZ 726 MIF (TMAH): 300 ml/min | |||
*Process DI water: 400 ml/min | |||
*Backside rinse DI water: 140 ml/min | |||
*Process Nitrogen: 20 l/min | |||
|} | |} | ||
<br clear="all" /> | <br clear="all" /> | ||
=Process information= | =Process information= | ||
All recipes use the following structure: | All recipes use the following structure: | ||
#Pressurize the TMAH canister | #Pressurize the TMAH canister | ||
#Pre-wet substrate at high RPM | |||
#Dispense puddle while rotating substrate slowly | #Dispense puddle while rotating substrate slowly | ||
#Puddle development with agitation of substrate | #Puddle development with agitation of substrate | ||