Specific Process Knowledge/Lithography/UVExposure/aligner MA6-2: Difference between revisions
No edit summary |
|||
| (One intermediate revision by the same user not shown) | |||
| Line 1: | Line 1: | ||
=Aligner: MA6-2= | |||
[[Image:AlignerMA6-2 in E-4.jpg|400px|thumb|The Aligner: MA6-2 is located in E-4.]] | [[Image:AlignerMA6-2 in E-4.jpg|400px|thumb|The Aligner: MA6-2 is located in E-4.]] | ||
| Line 18: | Line 18: | ||
The user manual, quality control procedures and results, user APVs, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=339 LabManager] - '''requires login''' | The user manual, quality control procedures and results, user APVs, and contact information can be found in [http://labmanager.dtu.dk/function.php?module=Machine&view=view&mach=339 LabManager] - '''requires login''' | ||
==Exposure dose== | |||
[[Specific Process Knowledge/Lithography/Resist/UVresist/exposureDoseMaskAligners#Aligner:_MA6-2|Information on UV exposure dose]] | [[Specific Process Knowledge/Lithography/Resist/UVresist/exposureDoseMaskAligners#Aligner:_MA6-2|Information on UV exposure dose]] | ||
==Process information== | |||
The Aligner: MA6-2 has an i-line notch filter installed. This results in an exposure light peak at 365nm. Compared to exposure on the KS Aligner, the optimal dose should be very similar. The 500W Hg-Xe lamp also enables exposure in the DUV range around 240nm. This functionality is not established yet, partly due to safety concerns. | The Aligner: MA6-2 has an i-line notch filter installed. This results in an exposure light peak at 365nm. Compared to exposure on the KS Aligner, the optimal dose should be very similar. The 500W Hg-Xe lamp also enables exposure in the DUV range around 240nm. This functionality is not established yet, partly due to safety concerns. | ||
| Line 67: | Line 67: | ||
|} | |} | ||
==Alignment== | |||
'''Top Side Alignment:''' | '''Top Side Alignment:''' | ||
*TSA microscope standard objectives: 5X, and 10X (20X available) | *TSA microscope standard objectives: 5X, and 10X (20X available) | ||
| Line 101: | Line 101: | ||
**High: 450µm x 650µm (950µm x 650µm full field) | **High: 450µm x 650µm (950µm x 650µm full field) | ||
=== Equipment performance and process related parameters | ==Light intensity and uniformity after lamp ignition== | ||
[[image:MA6-2_light_intensity_and_uniformity_from_ignition.png|400px|right|thumb|Light intensity and uniformity after lamp ignition. CP is constant power mode, CI is constant intensity mode. The accept limits for the CI mode is ±5%, the accept limit for the non-uniformity is 2%. CP mode has no accept limit.]] | |||
The lamp requires about 15 minutes of on-time after lamp ignition, before the light output has stabilized, and users using the constant power mode should always wait for 15 minutes after ignition, before starting processing. | |||
If users use the constant intensity mode, this waiting time is not necessary, since the internal light sensor automatically adjusts the output to match the setpoint value. | |||
The non-uniformity of the light, in CI mode, is unaffected by the stabilization time. | |||
<br clear="all" /> | |||
==Equipment performance and process related parameters== | |||
{|border="1" cellspacing="1" cellpadding="10" style="text-align:left;" | {|border="1" cellspacing="1" cellpadding="10" style="text-align:left;" | ||
| Line 161: | Line 172: | ||
|} | |} | ||
<sup>1)</sup> Not available | <sup>1)</sup> Not available. Requires tool change. Would require safety investigation (and a dedicated project) to become available. | ||
<br clear="all" /> | <br clear="all" /> | ||