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| {{:Specific Process Knowledge/Lithography/authors_generic}} | | {{cc-nanolab}} |
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| '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/LiftOff click here]''' | | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/LiftOff click here]''' |
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| =Lift-off Comparison Table= | | =Lift-off Comparison Table= |
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| {| border="2" cellspacing="0" cellpadding="2" | | {|border="1" cellspacing="1" cellpadding="10" style="text-align:left;" |
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| !colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment | | !colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment |
| |style="background:WhiteSmoke; color:black" align="center"|<b>[[Specific Process Knowledge/Lithography/LiftOff#Lift-off_wet_bench_07|Lift-off]]</b> | | |style="background:WhiteSmoke; color:black" align="center"|<b>[[Specific Process Knowledge/Lithography/LiftOff#Lift-off_wet_bench_07|Lift-off (wet bench 07)]]</b> |
| |style="background:WhiteSmoke; color:black" align="center"|<b>[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=370 Fume hood 03: Solvents]</b> - '''requires login''' | | |style="background:WhiteSmoke; color:black" align="center"|<b>[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=370 Fume hood 03: Solvents]</b> - '''requires login''' |
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| |style="background:LightGrey; color:black"| | | |style="background:LightGrey; color:black"| |
| |style="background:WhiteSmoke; color:black"| | | |style="background:WhiteSmoke; color:black"| |
| NMP (Remover 1165) / Rinse in IPA | | Lift-off bath with NMP (Remover 1165) |
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| | Rinse bath with diluted IPA |
| |style="background:WhiteSmoke; color:black"| | | |style="background:WhiteSmoke; color:black"| |
| User defined | | User defined |
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| =Lift-off at Nanolab=
| | {{:Specific Process Knowledge/Lithography/LiftOff/liftoff_wetbench07}} |
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| ==Lift-off wet bench 07==
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| [[Image:Lift_off.jpg|300x300px|thumb|Lift-off wet bench in D-3]]
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| The user manual, and contact information can be found in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=384 LabManager] - '''requires login'''
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| {| border="2" cellspacing="0" cellpadding="2" | |
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| !colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment
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| |style="background:WhiteSmoke; color:black" align="center"|<b>[[Specific Process Knowledge/Lithography/LiftOff#Lift-off_wet_bench_07|Lift-off]]</b>
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| !style="background:silver; color:black;" align="center"|Purpose
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| *Lift-off using UV resists, e.g.
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| ** AZ 5214E lift-off
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| ** AZ nLOF lift-off
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| *Lift-off using e-beam resists, e.g.
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| ** CSAR 62
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| *Resist strip of wafers with metal
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| !style="background:silver; color:black;" align="center"|Bath chemical
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| |style="background:LightGrey; color:black"|
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| |style="background:WhiteSmoke; color:black" align="center"|
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| NMP (Remover 1165) / Rinse in IPA
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| !style="background:silver; color:black" align="center" valign="center" rowspan="2"|Process parameters
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| |style="background:LightGrey; color:black"|Process temperature
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| |style="background:WhiteSmoke; color:black" align="center"|
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| Heating of the bath is possible.
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| The heating has been limited to 60°C
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| |style="background:LightGrey; color:black"|Ultrasonic agitation
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| |style="background:WhiteSmoke; color:black" align="center"|
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| Continuous or pulsed
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| The power may be varied
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| !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
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| |style="background:LightGrey; color:black"|Substrate size
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| |style="background:WhiteSmoke; color:black"|
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| * 100 mm wafers
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| * 150 mm wafers
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| | style="background:LightGrey; color:black"|Allowed materials
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| |style="background:WhiteSmoke; color:black" align="center"|
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| Silicon or glass wafers
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| Film or patterning of all but Type IV (Pb, Te)
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| |style="background:LightGrey; color:black"|Batch
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| 1 - 25
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| |}
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| === Process information ===
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| Lift-off is used for lift-off using resists that are soluble in NMP (''N''-Methyl-Pyrrolidone), supplied in the cleanroom as "Remover 1165". Both AZ 5214E and AZ nLOF are soluble in NMP.
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| For information on processing of AZ nLOF, or image reversal of AZ 5214E, see here: [[Specific_Process_Knowledge/Lithography/Resist/UVresist|Resist Overview]].
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