Specific Process Knowledge/Etch/ICP Metal Etcher: Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@ | '''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/ICP_Metal_Etcher click here]''' | ||
<!--Page reviewed by jmli 9/8-2022 --> | |||
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[[Category: Equipment |Etch ICP Metal]] | [[Category: Equipment |Etch ICP Metal]] | ||
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*[[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon nitride|Etch of silicon nitride]] | *[[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon nitride|Etch of silicon nitride]] | ||
*[[Specific Process Knowledge/Etch/Titanium Oxide/ICP metal|Etch of Titanium Oxide]] | *[[Specific Process Knowledge/Etch/Titanium Oxide/ICP metal|Etch of Titanium Oxide]] | ||
*[[Specific Process Knowledge/Etch/Aluminum Oxide/Al2O3 Etch with ICP Metal| | *[[Specific Process Knowledge/Etch/Titanium Nitride/ICP metal|Etch of Titanium Nitride]] | ||
*[[Specific Process Knowledge/Etch/Aluminum Oxide/Al2O3 Etch with ICP Metal|Al<sub>2</sub>O<sub>3</sub> Etch]] | |||
'''End point detection''' | |||
*[[/Examples of End point detection|Examples of End point detection]] | |||
==An overview of the performance of the ICP Metal Etcher and some process related parameters== | ==An overview of the performance of the ICP Metal Etcher and some process related parameters== | ||