Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano10: Difference between revisions
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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/nanoetch/nano10 click here]''' | |||
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== The nano1.0 recipe == | == The nano1.0 recipe == | ||
{{Template:Author-jmli1}} | |||
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{| border="2" cellpadding="2" cellspacing="1" | {| border="2" cellpadding="2" cellspacing="1" | ||
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</gallery> | </gallery> | ||
{| {{table}} | |||
| align="center" style="background:#f0f0f0;"|'''Nominal trench line width''' | |||
| align="center" style="background:#f0f0f0;"|'''''' | |||
| align="center" style="background:#f0f0f0;"|'''30''' | |||
| align="center" style="background:#f0f0f0;"|'''60''' | |||
| align="center" style="background:#f0f0f0;"|'''90''' | |||
| align="center" style="background:#f0f0f0;"|'''120''' | |||
| align="center" style="background:#f0f0f0;"|'''150''' | |||
| align="center" style="background:#f0f0f0;"|'''Avg''' | |||
| align="center" style="background:#f0f0f0;"|'''Std''' | |||
|- | |||
| Etch rates||nm/min||239||281||306||320||328||295||36 | |||
|- | |||
| Sidewall angle||degs||93||94||93||92||93||93||1 | |||
|- | |||
| CD loss||nm/edge||-1||-5||-11||-9||-32||-11||12 | |||
|- | |||
| CD loss foot||nm/edge||-1||-5||-11||-9||-2||-5||5 | |||
|- | |||
| Bowing||||41||33||29||30||22||31||7 | |||
|- | |||
| Curvature||||-51||-50||-43||-39||-42||-45||5 | |||
|- | |||
| zep||nm/min||||||||||||46|| | |||
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== Comments == | == Comments == | ||