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Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano143: Difference between revisions

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New page: == The nano1.43 recipe == {| border="2" cellpadding="2" cellspacing="1" |+ '''Recipe nano1.43''' |- ! rowspan="6" align="center"| Recipe | Gas | C<sub>4</sub>F<sub>8</sub> 75 sccm, SF<su...
 
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'''Feedback to this page''': '''[mailto:labadviser@nanolab.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.nanolab.dtu.dk/index.php/Specific_Process_Knowledge/Etch/DRIE-Pegasus/nanoetch/nano143 click here]'''
<!--Checked for updates on 30/7-2018 - ok/jmli -->
<!--Checked for updates on 5/10-2020 - ok/jmli -->
<!--Checked for updates on 4/9-2025 - ok/jmli -->
== The nano1.43 recipe ==
== The nano1.43 recipe ==
{{Template:Author-jmli1}}
<!--Checked for updates on 2/02-2023 - ok/jmli -->


{| border="2" cellpadding="2" cellspacing="1"  
{| border="2" cellpadding="2" cellspacing="1"  
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C4F8 75 sccm, SF6 38 sccm, 4 mTorr, Strike 3 secs @ 15 mTorr, 800 W CP, 30 W PP, -20 degs, 120 secs
C4F8 75 sccm, SF6 38 sccm, 4 mTorr, Strike 3 secs @ 15 mTorr, 800 W CP, 30 W PP, -20 degs, 120 secs
</gallery>
</gallery>
{| {{table}}
| align="center" style="background:#f0f0f0;"|'''Nominal trench line width'''
| align="center" style="background:#f0f0f0;"|''''''
| align="center" style="background:#f0f0f0;"|'''30'''
| align="center" style="background:#f0f0f0;"|'''60'''
| align="center" style="background:#f0f0f0;"|'''90'''
| align="center" style="background:#f0f0f0;"|'''120'''
| align="center" style="background:#f0f0f0;"|'''150'''
| align="center" style="background:#f0f0f0;"|'''Average'''
| align="center" style="background:#f0f0f0;"|'''Std. dev.'''
|-
| Etch rates||nm/min||139||147||149||152||152||148||6
|-
| Sidewall angle||degs||90||90||90||90||90||90||0
|-
| CD loss||nm/edge||6||-21||-21||-41||-45||-24||21
|-
| CD loss foot||nm/edge||11||-8||-8||-28||-18||-10||14
|-
| Bowing||||1||-1||1||1||0||0||1
|-
| Bottom curvature||||-50||-47||-34||-32||-31||-39||9
|-
| zep||nm/min||||||||||||55||
|-
|
|}
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