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'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/AFM:_Atomic_Force_Microscopy/AFM_Icon_Acceptance click here]'''  
'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/AFM:_Atomic_Force_Microscopy/AFM_Icon_Acceptance click here]'''  


<!-- Updated 20250812 -->
''This page has been made by Berit Herstrøm @ DTU Nanolab''
==Accessories following the systems ==
==Accessories following the systems ==
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{| border="2" cellspacing="0" cellpadding="2" valign="top"
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Phase: Phase imaging maps the phase lag between the periodic signal driving the cantilever and the oscillations of the cantilever. Changes in phase lag often indicate changes in the properties of the sample surface. Here the structuring in the graphene is very clear
Phase: Phase imaging maps the phase lag between the periodic signal driving the cantilever and the oscillations of the cantilever. Changes in phase lag often indicate changes in the properties of the sample surface. Here the structuring in the graphene is very clear


==AFM Icon-Pt 2: Acceptance test [[Image:section under construction.jpg|70px]]==
==AFM Icon-Pt 2: Acceptance test==
===Noise tests===
===Noise tests===
====Sensor noise====
====Sensor noise====
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*Step height: 1525 nm
*Step height: 1525 nm
[[File:SiO2-resist step Tapping mode with RFESP-75.JPG|400px]]
[[File:SiO2-resist step Tapping mode with RFESP-75.JPG|400px]]
===High Aspect ratio sample===
High aspect ratio samples (e.g. 100 nm wide trenches 300 nm deep and 2 µm wide trenches 6µm deep).  The probes for this: FIB6-400A.
This was done and work spaces were created but no images was saved.
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