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'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Characterization/AFM:_Atomic_Force_Microscopy/AFM_Icon_Acceptance click here]'''  
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<!-- Updated 20250812 -->
''This page has been made by Berit Herstrøm @ DTU Nanolab''
==Accessories following the systems ==
==Accessories following the systems ==
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Phase: Phase imaging maps the phase lag between the periodic signal driving the cantilever and the oscillations of the cantilever. Changes in phase lag often indicate changes in the properties of the sample surface. Here the structuring in the graphene is very clear
Phase: Phase imaging maps the phase lag between the periodic signal driving the cantilever and the oscillations of the cantilever. Changes in phase lag often indicate changes in the properties of the sample surface. Here the structuring in the graphene is very clear


==AFM Icon-Pt 2: Acceptance test [[Image:section under construction.jpg|70px]]==
==AFM Icon-Pt 2: Acceptance test==
===Noise tests===
===Noise tests===
====Sensor noise====
====Sensor noise====
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SEM images showed about 1.55µm – so it seems like ScanAsyst  is pressing a little down in the resist compared with the SiO2 giving a too small height difference.
SEM images showed about 1.55µm – so it seems like ScanAsyst  is pressing a little down in the resist compared with the SiO2 giving a too small height difference.
Therefor When scanning steps with difference materials, when one of the materials is soft and you need to know the height difference, then it seems to be best to use tapping mode.
Therefor When scanning steps with difference materials, when one of the materials is soft and you need to know the height difference, then it seems to be best to use tapping mode.
We did not save the images. Therefor I remeasured a few days later:
====Tapping mode with TAP150A====
*CL on
*256x32
*0dg
*Step height: 1545/1532 nm
[[File:SiO2-resist step Tapping mode with TAP150A.JPG|400px]]
====ScanAsyst with TAP150A====
*CL on
*256x32
*0dg
*ScanAsyst noise threshold: 1
*PeakForce amplitide 75 nm (was set as standard from the probe settings)
*Peak force frequency: 2 Hz
*Step height: 1537 nm
[[File:SiO2-resist step ScanAsyst mode with TAP150A.JPG|400px]]
====ScanAsyst with ScanAsyst-air====
*CL on
*256x32
*0dg
*ScanAsyst noise threshold: 1
*PeakForce amplitide 150 nm (I had to increase it from the 75 nm)
*Peak force frequency: 2 Hz
*Step height: 1545 nm
[[File:SiO2-resist step ScanAsyst mode with ScanAsyst-air.JPG|400px]]
====Tapping mode with RFESP-75====
*CL on
*256*32
*0dg
*Step height: 1525 nm
[[File:SiO2-resist step Tapping mode with RFESP-75.JPG|400px]]
===High Aspect ratio sample===
High aspect ratio samples (e.g. 100 nm wide trenches 300 nm deep and 2 µm wide trenches 6µm deep).  The probes for this: FIB6-400A.
This was done and work spaces were created but no images was saved.
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