Specific Process Knowledge/Characterization/XRD: Difference between revisions

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 =XRD at DTU Nanolab=
-We have two X-ray diffraction setups in building 346:
+We have three X-ray diffraction setups in building 346:
 *The [[/XRD_SmartLab|XRD SmartLab]] primarily for thin film analysis inside the cleanroom.
-*The [[/XRD_SmartLab|XRD SmartLab 9kW Rotating Anode]] multipurpose system outside the cleanroom.
+*The [[/XRD SmartLab 9kW Rotating Anode|XRD SmartLab 9kW Rotating Anode]] multipurpose system outside the cleanroom.
 *The [[/XRD_Powder|XRD Powder]] for phase analysis of powders outside the cleanroom.
 ==Experiments performed with XRD==
-*[[/Process Info|List and description of possible XRD measurements with typical setup requirements]] Note mostly relevant for XRD Smartlab
+*[[/Process Info|List and description of possible XRD measurements with typical setup requirements]] Note mostly relevant for XRD Smartlab and XRD Rot Anode
 ==Data analysis==
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 *[[/SLSII_analysis|Guide for using SmartLab Studio II for data analysis]]
 *[[/HighScore_analysis|Guide for using HighScore Plus for advanced powder data analysis]]
+*[[/XRD_Reference_Data|How to download reference spectra for individual crystal structures]] (for DTU users and others with access to the ICSD).
-Apart from this commercial software a wide range of free software is available online for data analysis. [https://xrd.mit.edu/xrd-software Here are some suggestions from MIT].
+Apart from commercial software a wide range of free software is available online for data analysis. Please let us know if you find something you'd like to recommend!
 ==Comparison of the XRDs at Nanolab==
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 !colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment
 |style="background:WhiteSmoke; color:black"|<b>XRD SmartLab</b>
+|style="background:WhiteSmoke; color:black"|<b>XRD RotAnode</b>
 |style="background:WhiteSmoke; color:black"|<b>XRD Powder</b>
 |-
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 *Quality and degree of orientation
 *3D orientation
-*Latice strain
+*Lattice strain
+*Composition
+*Twist
+*3D lattice constant
+*Thickness
+*Roughness
+*Density
+|style="background:WhiteSmoke; color:black"|
+*Phase ID
+*Crystal Size
+*Crystallinity
+*Quality and degree of orientation
+*3D orientation
+*Lattice strain
 *Composition
 *Twist
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 |style="background:WhiteSmoke; color:black"|
 kW
+|style="background:WhiteSmoke; color:black"|
+kW
 |style="background:WhiteSmoke; color:black"|
 W
@@ Line 64: / Line 81: @@
 |style="background:LightGrey; color:black"|
 Rated tube voltage
+|style="background:WhiteSmoke; color:black"|
+to 45 kV
 |style="background:WhiteSmoke; color:black"|
 to 45 kV
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 |style="background:WhiteSmoke; color:black"|
 to 60 mA
+|style="background:WhiteSmoke; color:black"|
+to 200 mA
 |style="background:WhiteSmoke; color:black"|
 mA
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 |style="background:WhiteSmoke; color:black"|
 Sealed tube
+|style="background:WhiteSmoke; color:black"|
+Rotating Anode
 |style="background:WhiteSmoke; color:black"|
 Sealed tube
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 |style="background:LightGrey; color:black"|
 Target
+|style="background:WhiteSmoke; color:black"|
+Cu
 |style="background:WhiteSmoke; color:black"|
 Cu
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 |style="background:WhiteSmoke; color:black"|
 .4 mm x 8 mm (Line/Point)
+|style="background:WhiteSmoke; color:black"|
+.1-0.5 mm x 8 mm (Line/Point)
 |style="background:WhiteSmoke; color:black"|
 .4 mm x 12 mm (Line)
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 |style="background:LightGrey; color:black"|
 Scanning mode
+|style="background:WhiteSmoke; color:black"|
+incident / receiver coupled or independent
 |style="background:WhiteSmoke; color:black"|
 incident / receiver coupled or independent
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 |style="background:LightGrey; color:black"|
 Goniomenter radius
+|style="background:WhiteSmoke; color:black"|
+mm
 |style="background:WhiteSmoke; color:black"|
 mm
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 |style="background:LightGrey; color:black"|
 Minimum step size
+|style="background:WhiteSmoke; color:black"|
+.0001° (0.36")
 |style="background:WhiteSmoke; color:black"|
 .0001° (0.36")
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 |style="background:LightGrey; color:black"|
 Sample stage motion
+|style="background:WhiteSmoke; color:black"|
+*&chi;:-5~+95°
+*&phi;:0~360°
+*Z:-4~+1 mm
+*X,Y:&plusmn;50 mm for a 100 mm wafer
+*Rx,Ry:-5~+5°
 |style="background:WhiteSmoke; color:black"|
 *&chi;:-5~+95°
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 *Cross Beam Optics(CBO)
 *Ge(220)x2 monochromator
+*In-Plane Parallel Slit Collimator (PSC)
+*Soller slit
+*Automatic variable divergence slit
+*Length limiting slits
+|style="background:WhiteSmoke; color:black"|
+*Cross Beam Optics(CBO)
+*Ge(400)x2 monochromator
 *In-Plane Parallel Slit Collimator (PSC)
 *Soller slit
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 *Parallel slit analysers (PSA)
 *Ge(220)x2 analyser
+|style="background:WhiteSmoke; color:black"|
+*Automatic variable scattering slit
+*Automatic variable receiver slit
+*Parallel slit analysers (PSA)
+*Ge(400)x2 analyser
 |style="background:WhiteSmoke; color:black"|
 *0.04° soller slit
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 !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Substrates
 |style="background:LightGrey; color:black"|Measurement temperature
+|style="background:WhiteSmoke; color:black"|
+Room temperature
 |style="background:WhiteSmoke; color:black"|
 Room temperature
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 |-
 |style="background:LightGrey; color:black"|Substrate size
+|style="background:WhiteSmoke; color:black"|
+up to 150 mm wafers
+Thickness max 21 mm
 |style="background:WhiteSmoke; color:black"|
 up to 150 mm wafers
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 No powders or dusty materials.
+|style="background:WhiteSmoke; color:black"|
+All materials have to be approved
 |style="background:WhiteSmoke; color:black"|
 All materials have to be approved